Ultraviolet-H2O2 oxidation of surfactants |
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Authors: | J. Sanz J. I. Lombraña A. de Luís |
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Affiliation: | Department of Chemical Engineering, University of the Basque Country (UPV/EHU), P.O. Box 644, 48080, Bilbao, Spain
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Abstract: | This paper describes a study of the treatment of surfactant synthetic solutions by chemical and photolytic oxidation. Synthetic solutions of linear alkylbenzene sulfonates (LAS) are treated in this work as this is a model compound commonly used in the formulation of detergents, with a great presence in urban and industrial waste-waters. The application of ultraviolet (UV) radiation combined with hydrogen peroxide to oxidize linear alkylbenzene sulfonates (LAS) is shown to be suitable as a primary oxidation step since conversions of about 50% of the original compounds are achieved in the most favorable cases. Initially, the influence of the operating variables on the degradation levels is analyzed in this work. A kinetic model that considers the contributions of both direct photolysis and radical attack is also worked out. Direct photolysis is performed to determine the quantum yield in the single photodecomposition reaction. In addition, the rate constant of the reaction between hydroxyl radicals and linear alkylbenzene sulfonates in the oxidizing system H2O2/UV is determined for different operational conditions. Finally, the contribution of each oxidation pathway is quantified, resulting in a higher contribution of the radical reaction than of photolysis in all cases. |
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