首页 | 本学科首页   官方微博 | 高级检索  
     检索      

微波辅助Bi_2WO_6光催化降解四氯酚研究
引用本文:何忠,杨绍贵,孙成.微波辅助Bi_2WO_6光催化降解四氯酚研究[J].环境科学与技术,2009,32(11).
作者姓名:何忠  杨绍贵  孙成
作者单位:污染控制与资源化研究国家重点实验室,南京大学环境学院,江苏,南京,210093
摘    要:采用水热法制备了纳米Bi2WO6,并用X射线衍射仪XRD、透射电镜TEM和比表面积分析仪BET表征其晶相结构、形貌及比表面积;然后以2,3,4,6-四氯酚(TeCP)为目标物考察了Bi2WO6在微波场中的光催化活性;最后探讨了TeCP在微波光催化反应体系中的降解机理。结果表明,微波辅助Bi2WO6光催化能够有效降解TeCP,反应20minTeCP(30mg/L)的去除率为94%,相应的动力学常数为0.191min-1;用GC/MS分析检测了此反应中TeCP的7种降解中间产物:2,3,4-三氯酚、2,3,5-三氯酚、2,3,6-三氯酚、2,4,5-三氯酚、2,4,6-三氯酚、3,4,5-三氯酚和2,3,5,6-四氯酚;推断在微波辅助Bi2WO6光催化反应体系TeCP的降解机理为TeCP异构化、脱氯、三氯酚异构化和矿化。

关 键 词:微波辅助光催化  Bi2WO6  2  3  4  6-四氯酚  降解机理

Microwave-assisted Photocatalytic Degradation of Tetrachlorophenol in Aqueous Bi2WO6 Suspensions
HE Zhong,YANG Shao-gui,SUN Cheng.Microwave-assisted Photocatalytic Degradation of Tetrachlorophenol in Aqueous Bi2WO6 Suspensions[J].Environmental Science and Technology,2009,32(11).
Authors:HE Zhong  YANG Shao-gui  SUN Cheng
Abstract:Bi2WO6 was successfully synthesized by a facile hydrothermal method,and characterized by X -ray diffraction (XRD),transmission electron microscopy (TEM)and Brunauer-Emmett-Teller (BET). Then the photocatalytic activity of Bi2WO6 on the degradation of 2,3,4,6-tetrachlorophenol (TeCP)in microwave-assisted photocatalytic degradation system (MPC)was investigated. The degradation mechanism of TeCP in MPC was discussed. Results illustrated that TeCP(30mg/L) was degraded effectively and removal efficiency was about 94% in 20min,with corresponding reaction rate constant 0.191min-1. Seven degradation intermediates of TeCP in MPC were identified by GC/MS,including 2,3,4-trichlorophenol,2,3,5 trichloropheno l,2,3,6-trichlorophenol,2,4,5-trichlorophenol,2,4,6-trichlorophenol,3,4,5-trichlorophenol and 2,3, 5,6 -trichlorophenol. The possible degradation mechanism of TeCP in MPC included four processes including TeCP isomerization,dechlorination, trichlorophenol isomerization and mineralization,which coexisted in microwave -assisted photocatalytic system.
Keywords:Bi2WO6
本文献已被 CNKI 万方数据 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号