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低温碱溶脱除液晶显示器(LCD)玻璃基板粉末中的硅和铝
引用本文:王帅, 关杰, 任浩华, 袁昊, 苏瑞景, 顾卫星, 徐林元, 谢俊燕, 谭伟兴. 低温碱溶脱除液晶显示器(LCD)玻璃基板粉末中的硅和铝[J]. 环境工程学报, 2015, 9(12): 6078-6082. doi: 10.12030/j.cjee.20151269
作者姓名:王帅  关杰  任浩华  袁昊  苏瑞景  顾卫星  徐林元  谢俊燕  谭伟兴
作者单位:1.上海第二工业大学城市建设与环境工程学院, 上海 201209; 2.中国矿业大学(北京)化学与环境工程学院, 北京 100083; 3.上海巨浪环保有限公司, 上海201700; 4.上海外高桥环保服务公司, 上海 200131
基金项目:上海市自然科学基金资助项目(15ZR1416800) 上海青浦区产学研合作项目上(2015-9) 中小企业创新基金(1305H146300) 上海第二工业大学培育学科资助项目(XXKPY1303)
摘    要:为了提高氯化法回收LCD中铟的效果,降低SiO2和Al2O3对氯化过程的干扰,采用NaOH对液晶显示器玻璃基板粉末中的硅和铝进行了预先溶出规律研究.首先分析了LCD粉末中SiO2和Al2O3的含量、形貌以及铟的浸出变化,然后计算了SiO2和Al2O3的脱除效率.在条件实验基础上通过正交实验设计得出优化实验条件.研究表明,在液固比为90:2、温度95℃、溶出时间2 h、碱度0.56 g/L的最佳工艺条件下, SiO2的脱除率为80.88%、Al2O3的脱除率为 83.30%、二者总的脱除率为81.30%,洗涤液中没有发现铟的溶出,碱溶后的物料表面产生大量均匀的孔状结构.这将对液晶显示器玻璃基板粉末的资源化与铟的富集有重要意义.

关 键 词:碱溶法   液晶显示器   玻璃基板   硅和铝   脱除率
收稿时间:2014-11-14

Desorption of silicon and aluminum in LCD glass powder at low temperature and alkali dissolution
Wang Shuai, Guan Jie, Ren Haohua, Yuan Hao, Su Ruijing, Gu Weixing, Xu Linyuan, Xie Junyan, Tan Weixing. Desorption of silicon and aluminum in LCD glass powder at low temperature and alkali dissolution[J]. Chinese Journal of Environmental Engineering, 2015, 9(12): 6078-6082. doi: 10.12030/j.cjee.20151269
Authors:Wang Shuai  Guan Jie  Ren Haohua  Yuan Hao  Su Ruijing  Gu Weixing  Xu Linyuan  Xie Junyan  Tan Weixing
Affiliation:1.School of Urban Development and Environmental Engineering, Shanghai Second Polytechnic University, Shanghai 201209, China; 2.School of Chemical and Environmental Engineering, China University of Mining & Technology, Beijing 100083, China; 3.Shanghai Julang Environmental Protection Co. Ltd., Shanghai 201700, China; 4.Shanghai Waigaoqiao Environmental Services Co. Ltd., Shanghai 200131, China
Abstract:NaOH solution was employed to dissolve SiO2 and Al2O3 in the glass substrate of liquid crystal display (LCD) to reduce their interference on chlorination process and improve the recovery rate of indium. The content and morphology of SiO2 and Al2O3 as well as the extraction of indium were analyzed and the removal efficiency of SiO2 and Al2O3 was calculated. Optimal condition was obtained by condition experiment and orthonormal test. Results indicate that the removal rates of SiO2 and Al2O3 are 80.88% and 83.30%, respectively and the total removal rate is 81.30% when liquid-solid ratio is 90:2, temperature is 95℃, dissolution time is 2 h and alkalinity is 0.56 g/L. No indium is found in the washing water. A large number of homogeneous pore structure generate on the surface of the alkali dissolved glass substrate. This is of great significance to the recycling of the LCD glass powder and the enrichment of indium.
Keywords:alkali dissolution  liquid crystal display  glass substrate  SiO2 and Al2O3  removal efficiency
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