二级Fenton氧化高浓度有机硅废水研究

采用二级Fenton氧化技术对可生化性差的高浓度有机硅废水进行处理,考察了不同因素对COD去除率的影响,对比了一级氧化和二级氧化的效果。结果表明对于COD为9 600 mg/L的高浓度有机硅废水,pH为3,H2O2]/Fe2+]=2∶1为最佳的反应条件,COD去除率随着H2O2的投加量的增大先增大而后减小,每200 mL水样中先投加20%的硫酸亚铁12 mL,然后分2次投加30%的H2O2各4 mL,氧化完成后调整pH值为7~8静止沉淀,COD去除率达89.2%。对于某绝缘电器厂的生产废水经二级Fenton氧化处理后,出水有机物浓度显著降低,可生化性提高,Fenton二级氧化可以作为高浓度有机硅废水的预处理工艺。

Two-stage oxidation of wastewater containing organic silicon by Fenton reagent

The two-stage Fenton oxidization was employed to treat the high content organic silicon wastewater, and the research of impacts of different factors on COD removal and the comparison between the effects of first and the second stage oxidization were also carried out. The results showed that: to the 9600 mg/L COD content organic silicon wastewater, the optimal reaction conditions were: pH = 3, H_2O_2] /Fe~(2+)] =2: 1 ; with the increasing of H_2O_2 dosage, the COD removal would increase first then decrease; with the dosage of 200 mL of 20% ferrous sulfate and twice dosage of 30% H_2O_2 4 mL each time, the pH was 7 ～ 8 after oxidization, and the COD removal was 89.2% after sedimentation. After the second stage Fenton oxidization, the organic content in insulating apparatus wastewater decreased, the biodegradability was improved. The Fenton two stage oxidization could be used as pretreatment for high content organic silicon wastewater.