表面活性剂对萘在静水面挥发的影响

研究了十二烷基苯磺酸钠(SDBS)、十二烷基硫酸钠(SDS)、十六烷基三甲基溴化铵(CTMAB)和Brij30对萘在静水面挥发的影响规律和机理.结果表明,表面活性剂浓度大于临界胶束浓度(C_mc)时,萘在稳态过程中的气/液分配比减小.表面活性剂单体及其单体形成的低聚物的存在,能降低萘的挥发速率,而表面活性剂胶束的形成并增加,是萘在静水面挥发速率降低的主要原因;浓度为相同Cmc倍数的表面活性剂存在时,亲水性的表面活性剂对降低萘的挥发速率的能力明显强于亲油性的表面活性剂.

Influence of surfactants on the evaporation of naphthalene from static water

The influence rule and mechanism of sodium dodecylbenzene sulfonate (SDBS), sodium dodecyl sulfate (SDS), cetyltrimethyl ammonium bromide(CTMAB) and Brij30 on the evaporation of naphthalene from static water was studied. The gas/liquid distribution rate of naphthalene in stable process decreased, when the surfactant concentration was above critical micelle concentration (Cmc). The evaporative loss velocity of naphthalene decreased owing to the surfactant monomers and dimers or trimers which aggregated by monomers. While the main reason for the decrease of evaporative velocity of naphthalene from static water was the formation and increase of the surfactant micelle. The ability of hydrophilic surfactants on diminishing the evaporative velocity of naphthalene was stronger markedly than that of lipophilic surfactants, when the surfactants had concentrations of same Cmc multiple.