| 微弧氧化技术的发展现状和存在问题分析 |
| |
| 引用本文： | 孙志华,刘明,国大鹏,汤智慧,陆峰.微弧氧化技术的发展现状和存在问题分析[J].装备环境工程,2009,6(6):46-49. |
| |
| 作者姓名： | 孙志华 刘明 国大鹏 汤智慧 陆峰 |
| |
| 作者单位： | 中国航空工业集团公司,北京航空材料研究院,北京,100095 |
| |
| 摘 要： | 概述了微弧氧化技术的国内外研究现状、成膜机理和涂层制备的影响因素以及应用情况等，并对微弧氧化技术存在的问题和发展趋势进行了探讨。微弧氧化技术在民用、航空航天等领域具有广阔的发展前景，但至今没有一个完美的理论模型来解释整个微孤氧化成膜的过程；电解液的稳定性问题也是困扰企业和急待解决的难题，而低处理效率和高能耗问题是限制微弧氧化技术产业化应用的关键。
|
| 关 键 词： | 微弧氧化 发展现状 存在问题 |
Analysis on Recent Development and Problems of Micro-arc Oxidation Technology |
| |
| SUN Zhi-hua,LIU Ming,GUO Da-peng,TANG Zhi-hui,LU Feng.Analysis on Recent Development and Problems of Micro-arc Oxidation Technology[J].Equipment Environmental Engineering,2009,6(6):46-49. |
| |
| Authors: | SUN Zhi-hua LIU Ming GUO Da-peng TANG Zhi-hui LU Feng |
| |
| Institution: | (Beijing Institute of Aeronautical Materials, Beijing 100095, China) |
| |
| Abstract: | The research status, film formation mechanism, influencing factors, and application of micro-arc oxidation （MAO） technology were summarized, and the existing problems and developing trend of MAO technology were also analyzed. MAO technology has widely application prospects in civil, aeronautics, and astronautics industries, but there is not a perfect theoretical model to explain the whole process of MAO. Electrolytic stability, lower coating disposition ration, and higher energy consumption are still the problems to be solved. |
| |
| Keywords: | micro-arc oxidation recent development current problem |
| 本文献已被 维普 万方数据 等数据库收录！ |
|
