首页 | 本学科首页   官方微博 | 高级检索  
     检索      

Fe/C微电解 絮凝沉淀法处理电镀废水中铜的研究
引用本文:彭人勇,程宝珍.Fe/C微电解 絮凝沉淀法处理电镀废水中铜的研究[J].环境工程学报,2012,6(2):501-504.
作者姓名:彭人勇  程宝珍
作者单位:青岛科技大学环境与安全工程学院,青岛,266042
基金项目:山东省自然科学基金资助项目(2009ZRB019KH)
摘    要:利用Fe/C微电解-絮凝沉淀法去除青岛某电子有限公司电镀废水中Cu2+。通过正交与单因素实验,考察了废水初始pH,Fe/C,Fe投加量,反应时间对Cu2+处理效果的影响。实验结果表明:在初始pH=4、Fe/C(质量)=2/1、Fe投加量=60 g/L、反应时间=60 min的实验条件下,絮凝出水Cu2+含量由641.78 mg/L降至0.32 mg/L,还原率高达99.95%,同时COD去除率23.57%。出水Cu2+含量达到山东省半岛流域水污染物综合排放Ⅰ级标准。

关 键 词:电镀废水    Fe/C微电解  絮凝沉淀

Treatment of copper from electroplating wastewater by Fe/C micro-electrolysis-flocculation-deposition process
Peng Renyong and Cheng Baozhen.Treatment of copper from electroplating wastewater by Fe/C micro-electrolysis-flocculation-deposition process[J].Techniques and Equipment for Environmental Pollution Control,2012,6(2):501-504.
Authors:Peng Renyong and Cheng Baozhen
Institution:Peng Renyong Cheng Baozhen(College of Security and Environment Science,Qingdao University of Science & Technology,Qingdao 266042,China)
Abstract:Iron-carbon micro-electrolysis-flocculating deposition was applied in the treatment of electroplating wastewater containing Cu2+ from an electronic Co.,Ltd.in Qingdao.The effects of initial pH,Fe/C(quality),the dosage of Fe,and the reaction time on removal of Cu2+were investigated by orthogonal and single factor experiments.The test results indicate that when initial pH value is 4,Fe/C(quality) is 2/1,the dosage of Fe is 60 g/L,and the reaction time is 60 min,the concentration of Cu2+ in electroplating wastewater decreases from 641.78 mg/L to 0.32 mg/L,the removal efficiency achieves 99.95%,and the COD removal efficiency achieves 23.57%.The concentration of Cu2+ in electroplating wastewater meets the first-grade standard for discharge of water pollutants in Shandong Province Peninsula Basin(DB37676-2007).
Keywords:electroplating wastewater  copper  Fe/C micro-electrolysis  flocculation-deposition
本文献已被 CNKI 万方数据 等数据库收录!
点击此处可从《环境工程学报》浏览原始摘要信息
点击此处可从《环境工程学报》下载免费的PDF全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号