Product Guide/1982 |
| |
| Authors: | Chuen-Jinn Tsai Chia-Hung Lin Yu-Min Wang Cheng-Hsiung Hunag Shou-Nan Li Zong-Xue Wu |
| |
| Institution: | 1. Institute of Environmental Engineering , National Chiao Tung University , Hsinchu , Taiwan , Republic of China cjtsai@mail.nctu.edu.tw;3. Institute of Environmental Engineering , National Chiao Tung University , Hsinchu , Taiwan , Republic of China;4. Department of Environmental Engineering and Health , Yuanpei University of Science and Technology , Hsinchu , Taiwan , Republic of China;5. Center for Environmental, Safety, and Health Technology , Industrial Technology Research Institute Hsinchu , Taiwan , Republic of China;6. Integrated Plasma Inc , Hsinchu , Republic of China |
| |
| Abstract: | Abstract An efficient venturi scrubber system making use of heterogeneous nucleation and condensational growth of particles was designed and tested to remove fine particles from the exhaust of a local scrubber where residual SiH4 gas was abated and lots of fine SiO2 particles were generated. In front of the venturi scrubber, normal-temperature fine-water mist mixes with high-temperature exhaust gas to cool it to the saturation temperature, allowing submicron particles to grow into micron sizes. The grown particles are then scrubbed efficiently in the venturi scrubber. Test results show that the present venturi scrubber system is effective for removing submicron particles. For SiO2 particles greater than 0.1 μm, the removal efficiency is greater than 80–90%, depending on particle concentration. The corresponding pressure drop is relatively low. For example, the pressure drop of the venturi scrubber is ～15.4 ± 2.4 cm H2O when the liquid-to-gas ratio is 1.50 L/m3. A theoretical calculation has been conducted to simulate particle growth process and the removal efficiency of the venturi scrubber. The theoretical results agree with the experimental data reasonably well when SiO2 particle diameter is greater than 0.1 μm. |
| |
| Keywords: | |
|
|
