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介质阻挡放电去除NO的实验研究
引用本文:赵文华,张旭东.介质阻挡放电去除NO的实验研究[J].环境科学学报,2004,24(1):107-110.
作者姓名:赵文华  张旭东
作者单位:清华大学工程力学系,北京,100084;清华大学工程力学系,北京,100084
摘    要:设计了一套高压电源和同轴圆柱 -筒介质阻挡放电反应器装置 ,进行了冷等离子体去除NO的实验研究 ,结果表明该方法是有效的 .研究了气体流量、NO初始浓度、放电电压、O2 含量以及中心电极尺寸对NO去除效率的影响 .当流量较小或NO初始浓度较低时 ,有较高的去除率 ;流量变大和NO初始浓度增加时 ,NO的去除率将下降 .放电电压升高 ,NO去除率将增大 .O2 的存在会降低NO的去除率 .放电管其它特征尺寸给定条件下 ,中心电极存在一个最佳直径 ,使得NO的去除效果最为理想 .

关 键 词:介质阻挡放电  冷等离子体  NO去除
文章编号:0253-2468(2004)01-0107-04
收稿时间:2003/2/24 0:00:00
修稿时间:2003年2月24日

The experimental research of NO removal with the dielectric barrier discharge non-thermal plasma
ZHAO Wenhua and ZHANG Xudong.The experimental research of NO removal with the dielectric barrier discharge non-thermal plasma[J].Acta Scientiae Circumstantiae,2004,24(1):107-110.
Authors:ZHAO Wenhua and ZHANG Xudong
Institution:Department of Engineering Mechanics, Tsinghua University, Beijing 100084 and Department of Engineering Mechanics, Tsinghua University, Beijing 100084
Abstract:A set of experimental setup of the high voltage power and coaxial cylinder-tube dielectric barrier discharge reaction vessel is designed to investigate NO removal with non-thermal plasma produced by barrier discharges. The method is proved to be effective. The influences of the gas flow rate, NO initial concentration, applied voltage; contents of O_2 and the diameter of the central electrode on the NO removal rate are also investigated respectively. The NO removal rate is high at small gas flow rate or low NO initial concentration, while it will decrease remarkably with the gas flow rate or NO initial concentration increasing. Moreover, the removal rate will increase with the discharge voltage increasing. The existence of O_2 can lead to the decreasing of the NO removal rate. The diameter of the central electrode will also influence the NO removal rate, and when the other conditions are given, the optimal NO removal rate can be obtained through the optimization of the diameter of the central electrode.
Keywords:dielectric barrier discharge  non-thermal plasma  NO removal
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