| O3/UV降解含氮杂环化合物喹啉 |
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| 引用本文： | 陈傲蕾,常风民,汪翠萍,徐恒,吴静,左剑恶,王凯军.O3/UV降解含氮杂环化合物喹啉[J].环境科学,2016,37(10):3884-3890. |
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| 作者姓名： | 陈傲蕾 常风民 汪翠萍 徐恒 吴静 左剑恶 王凯军 |
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| 作者单位： | 清华大学环境学院环境模拟与污染控制国家重点联合实验室, 北京 100084;中国矿业大学(北京)化学与环境工程学院, 北京 100083,清华大学环境学院环境模拟与污染控制国家重点联合实验室, 北京 100084,清华大学环境学院环境模拟与污染控制国家重点联合实验室, 北京 100084,清华大学环境学院环境模拟与污染控制国家重点联合实验室, 北京 100084,清华大学环境学院环境模拟与污染控制国家重点联合实验室, 北京 100084,清华大学环境学院环境模拟与污染控制国家重点联合实验室, 北京 100084,清华大学环境学院环境模拟与污染控制国家重点联合实验室, 北京 100084 |
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| 基金项目： | 北京市自然科学基金与北京市科学技术研究院联合资助项目（L140011）；国家水体污染控制与治理科技重大专项（2014ZX07211001） |
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| 摘 要： | 本研究采用O3/UV工艺降解喹啉溶液,系统地探讨了喹啉初始浓度、反应后置时间、初始p H、HCO-3浓度等因素对降解过程的影响.通过测定降解过程中的中间产物,分析了喹啉的降解机制及途径.结果表明随着喹啉初始浓度增加,反应表观速率常数和去除率都降低;p H(7~9)碱性条件时降解效果最好;HCO-3的存在明显降低了喹啉的去除率,加入100 mg·L-1HCO-3喹啉去除率降低了42.01%;反应后置时间对喹啉的去除率及矿化率基本没有影响.喹啉的降解中间产物主要为8-羟基喹啉、5-羟基喹啉、2(1H)-喹啉酮、2-吡啶甲醛等,喹啉在O3/UV体系中的降解途径主要由羟基自由基(·OH)、O3氧化剂发生的加成反应、取代反应、亲电反应等.
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| 关 键 词： | 喹啉 含氮杂环化合物 O3/UV 气相色谱-质谱联用 羟基自由基 降解途径 |
| 收稿时间： | 2016/3/21 0:00:00 |
| 修稿时间： | 2016/5/24 0:00:00 |
Degradation of the Nitrogenous Heterocyclic Compound Quinoline by O3/UV |
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| CHEN Ao-lei,CHANG Feng-min,WANG Cui-ping,XU Heng,WU Jing,ZUO Jian-e and WANG Kai-jun.Degradation of the Nitrogenous Heterocyclic Compound Quinoline by O3/UV[J].Chinese Journal of Environmental Science,2016,37(10):3884-3890. |
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| Authors: | CHEN Ao-lei CHANG Feng-min WANG Cui-ping XU Heng WU Jing ZUO Jian-e and WANG Kai-jun |
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| Institution: | State Key Joint Laboratory of Environment Simulation and Pollution Control, School of Environment, Tsinghua University, Beijing 100084, China;Department of Chemical and Environmental Engineering, China University of Mining and Technology, Beijing 100083, China,State Key Joint Laboratory of Environment Simulation and Pollution Control, School of Environment, Tsinghua University, Beijing 100084, China,State Key Joint Laboratory of Environment Simulation and Pollution Control, School of Environment, Tsinghua University, Beijing 100084, China,State Key Joint Laboratory of Environment Simulation and Pollution Control, School of Environment, Tsinghua University, Beijing 100084, China,State Key Joint Laboratory of Environment Simulation and Pollution Control, School of Environment, Tsinghua University, Beijing 100084, China,State Key Joint Laboratory of Environment Simulation and Pollution Control, School of Environment, Tsinghua University, Beijing 100084, China and State Key Joint Laboratory of Environment Simulation and Pollution Control, School of Environment, Tsinghua University, Beijing 100084, China |
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| Abstract: | The influences of various factors including initial concentration of quionline solution, static duration after reaction, initial pH, HCO3-on the degradation of quinoline by O3/UV were analyzed in this study. In addition, the degradation mechanism and pathways were also analyzed. The results showed that reaction rate constants and removal rate of quinoline decreased with the increase of the initial concentration of quinoline. The best degradation efficiency of quinoline was achieved under the alkaline conditions (pH 7-9). Removal rate of quinoline was obviously influenced by HCO3-, and was reduced by 42.01% within 6 min when the concentration of HCO3- was 100 mg·L-1. There was neglected effect of static duration after reaction on the removal rate and mineralization rate of quinolone. The intermediate products of quinoline were mainly 8-hydroxyquinoline, 5-hydroxyquinoline, 2(1H)-quinoline ketone, 2-pyridinecarboxaldehyde and so on. The main degradation pathways of quinoline in the O3/UV system were addition reaction, substitution reaction and electrophilic substitution mediated by O3 and·OH. |
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| Keywords: | quinoline nitrogenous heterocyclic compounds O3/UV GC-MS · OH degradation pathways |
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