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光致抗蚀剂乳化废水中有机物GC/MS分析
引用本文:马前,李义久,刘亚菲,曾新平,倪亚明,胡耀铭.光致抗蚀剂乳化废水中有机物GC/MS分析[J].四川环境,2002,21(3):48-50.
作者姓名:马前  李义久  刘亚菲  曾新平  倪亚明  胡耀铭
作者单位:1. 同济大学分析测试中心,上海,200092
2. 复旦大学分析测试中心,上海,200433
摘    要:采用色谱-质谱(GC/MS)联用分析仪分析了电子工业光致抗蚀剂乳化废水中的有机化合物成份,测定了该废水中各种有机污染物的含量。分析结果表明:电子工业中光致抗蚀剂乳化废水的主要成份为有机酸类、醛类、酯类、胺类、芳香酮类、酸酐类、砜类、聚醚类、醇类、芳香烃类、杂环类十一大类有机化合物,其中聚丙二醇类、脂肪酸类、丁烯酸类、苯甲酸类、苯甲酸胺、烷基酚聚氧乙烯醚类和噻吩类约占总有机碳含量的95%以上。有机污染物的分析测定对此类废水的处理工艺的研究具有重要的指导作用。

关 键 词:光致抗蚀剂  乳化废水  有机物  GC/MS分析  化学  水质分析
文章编号:1001-3644(2002)03-0048-03
修稿时间:2002年3月29日

Determination of Organic Pollutants by GC/MS in Photoresist Emulsified Wastewater
MA Qian ,LI Yi-ju ,LIU Ya-fei ,ZENG Xin-ping ,NI Ya-min g ,HU Yao-ming.Determination of Organic Pollutants by GC/MS in Photoresist Emulsified Wastewater[J].Sichuan Environment,2002,21(3):48-50.
Authors:MA Qian  LI Yi-ju  LIU Ya-fei  ZENG Xin-ping  NI Ya-min g  HU Yao-ming
Institution:MA Qian 1,LI Yi-ju 1,LIU Ya-fei 1,ZENG Xin-ping 1,NI Ya-min g 1,HU Yao-ming 2
Abstract:This paper reported that the composition o f the photoresist's emulsif ied wastewater in the electronic industry and the concentration of each organic compound were analyzed by GC/MS. The analysis results showed that the main organ ic pollutants were organic acids,propylene glycol,aldehyde,ester,amine,aromatic ketone,phenoxy polyvinyl ether,phthalic anhydride,sulfone,alcohol,aromatic hydr ocarbon,thiophene,and heterocyclic compounds,among which propylene glycol,fatty acid ,butenoic acid,benzoic acid,benzoic acid aminde,phenoxy polyvinyl ether,thiophen e et al account for above 95% of total organic carbon content.The work provides the base for the removal of the organic pollutants in the source and process des ign.
Keywords:GC/MS analysis  methylene chloride  extraction  pho toresist emulsified wastewater
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