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基于不同自由基的高级氧化技术对水中诺氟沙星的去除效果
引用本文:许若梦, 吴桐, 锁瑞娟, 钱雅洁. 基于不同自由基的高级氧化技术对水中诺氟沙星的去除效果[J]. 环境工程技术学报, 2020, 10(3): 433-439. doi: 10.12153/j.issn.1674-991X.20190177
作者姓名:许若梦  吴桐  锁瑞娟  钱雅洁
作者单位:东华大学环境科学与工程学院
摘    要:
抗生素在水中的赋存浓度较低,难以被常规的城市污水处理系统有效去除。考察了紫外光联合氯(UV/氯)、双氧水(UV/H2O2)、过硫酸盐(UV/PS) 3种高级氧化体系对诺氟沙星(NFX)的去除效果。结果表明:UV/氯体系降解NFX相比于其他2种具有显著的高效性,当溶液初始pH为7、氯浓度为30 μmol/L时,NFX在2 min内的去除率可达98.67%,相同氧化剂浓度下,UV/H2O2和UV/PS体系10 min内对NFX的去除率仅为41.41%和65.73%;对于UV/氯体系,NFX的去除率随氯浓度的升高而上升,同时考虑成本,最优氯浓度为30 μmol/L;pH影响3种体系对NFX的去除速率,但效果不同,对于UV/氯体系,强碱性条件有利于NFX的去除,对于UV/H2O2和UV/PS体系,中性及弱碱性更有利于NFX的去除;水体基质Cl-对UV/氯体系去除NFX有抑制作用,但对UV/H2O2和UV/PS体系影响不大; HCO 3 - 对3种体系去除NFX均有抑制作用。

关 键 词:抗生素   诺氟沙星   UV/氯   高级氧化技术(AOPs)
收稿时间:2019-10-20

Removal performance of norfloxacin from waters by advanced oxidation processes based on different free radicals
XU Ruomeng, WU Tong, SUO Ruijuan, QIAN Yajie. Removal performance of norfloxacin from waters by advanced oxidation processes based on different free radicals[J]. Journal of Environmental Engineering Technology, 2020, 10(3): 433-439. doi: 10.12153/j.issn.1674-991X.20190177
Authors:XU Ruomeng  WU Tong  SUO Ruijuan  QIAN Yajie
Affiliation:College of Environmental Science and Engineering, Donghua University
Abstract:
Because of their low occurrence concentration in water, the antibiotics are difficult to be effectively removed by the conventional municipal sewage treatment system. The removal efficiency of norfloxacin (NFX) by ultraviolet combined chlorine (UV/chlorine), hydrogen peroxide (UV/H2O2) and persulfate (UV/PS) was investigated. The results showed that the degradation of NFX by UV/chlorine was significantly more efficient than the other two systems. When the initial pH of solution was 7 and the concentration of chlorine was 30 μmol/L, the removal rate of NFX in 2 min could reach 98.67%. At the same oxidant concentration, the removal rate of NFX was 41.41% and 65.73% after 10 min by UV/H2O2 and UV/PS, respectively. For UV/chlorine system, the removal rate of NFX increased with the increase of chlorine concentration with the optimal concentration being 30 μmol/L. The pH had different effects on the removal rate of NFX by three systems. For UV/chlorine system, strong alkaline condition was beneficial for the removal of NFX, while neutral and weak alkalinity was more favorable for the removal of NFX for UV/H2O2 and UV/PS. Cl-in water matrix inhibited the removal of NFX by UV/chlorine, but had little effect on UV/H2O2 and UV/PS, while HCO 3 - inhibited the removal of NFX by all three systems.
Keywords:antibiotics  norfloxacin  UV  chlorine  advanced oxidation processes(AOPs)
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