Study on the optical property and surface morphology of N doped TiO2 film deposited with different N2 flow rates by DCPMS

N doped TiO₂ films were deposited by direct current pulse magnetron sputtering system at room temperature. By using UV-Vis spectrophotometer and atomic force microscope, we studied the influence of N₂ flow rate on the optical property and surface morphology of films. The results indicate that the optical property and surface morphology of N doped TiO₂ film was dominated by the N₂ flow rate. The mean absorbency in visible range of pure TiO₂ films is near to 0%, which means that the pure TiO₂ could hardly display the photocatalytic property in visible range. When N₂ flow rate is 2 sccm, the mean absorbency in visible range of N doped TiO₂ film could reach at 24%. In this case, the film could be used as photocatalyst induced by visible light. While with increasing N₂ flow rate, the mean absorbency in visible range of N doped TiO₂ film decreased abruptly. Especially when N₂ flow rate exceeded 8 sccm, the mean absorbency in visible range of N doped TiO₂ film decreased to about 0%, which is like pure TiO₂ fimls.     

COD/SO_4~(2-)值对硫酸盐废水厌氧消化的影响

采用间歇试验方式,研究了COD/SO_4~(2-)值对硫酸盐废水厌氧消化的影响。试验结果表明,COD/SO_4~(2-)值是影响厌氧消化处理效果的主要参数。本试验中,COD/SO_4~(2-)>15,硫酸盐还原作用对厌氧反应器影响甚微;COD/SO_4~(2-)=5—15时,硫酸盐还原作用对厌氧反应器产生轻度抑制,相对产甲烷率为79.2％—94.7％;COD/SO_4~(2-)=0.5—5时,反应器受中度抑制,相对产甲烷率为61.6％—79.2％;COD/SO_4~(2-)<0.5时,反应器受严重抑制。COD/SO_4~(2-)≥1时,相对产甲烷率与COD/SO_4~(2-)值之间有很好的线性关系。