UV/H2O2工艺降解环丙沙星的研究

采用UV/H2O2工艺去除水体中的喹诺酮类抗生素环丙沙星（CIP）。考察了溶液pH值、H2O2投加量以及水体基质对环丙沙星降解效率的影响,分析了降解产物的生成情况。研究表明,环丙沙星的降解符合拟一级反应动力学模型。降解速率受溶液pH值的影响,酸性及中性条件,有利于环丙沙星的降解。H2O2投加量的增大,使得降解速率逐渐增大,但速率增幅逐渐变缓;最佳H2O2/环丙沙星摩尔比为2 000。实际水体中存在的NOM、NO3-,促进了单独UV作用下,环丙沙星的降解。水体中的.OH焠灭剂,抑制了UV/H2O2联合作用下,环丙沙星的降解;实际水体中的光解速率常数低于超纯水中的光解速率常数。GC-MS分析表明,UV/H2O2工艺,使环丙沙星氧化降解生成氨基乙酸、丙二酸、丙三醇和对苯二甲酸等小分子有机物。     

Role of cupric ions in the H2O2/UV oxidation of humic acids

The purpose of this study is to reveal the role of cupric ions as a natural water contaminant in the H2O2/UV oxidation of humic acids. Humic acids are naturally occurring organic matter and exhibit a strong tendency of complexation with some transition metal ions. Chlorination of humic acids causes potential health hazards due to formation of trihalomethane (THM). The removal of THM precursors has become an issue of public concern. The H2O2/UV process is capable of mineralizing humic acids due to formation of a strong oxidant, hydroxyl radicals, in reaction solution. Experiments were conducted in a re-circulated photoreactor. Different cupric concentrations (0-3.8 mg/l) and different pH values (4-9) were controlled to determine their effects on the degradation of humic acids, UV light absorbance at 254 nm, and H2O2. The presence of cupric ions inhibits humic mineralization and decreases the rate of destruction of humic acids which absorb UV light at 254 nm. On the other hand, the higher the cupric concentration, the lower the H2O2 decomposition rate. In the studied pH range, the minimum of total organic carbon (TOC) removal occurs at pH = 6 in the presence of 2.6 mg/l of cupric ions; both acidification (pH = 4) and alkaline condition (pH = 9) lead to a better removal of TOC. It is inferred from this study that the cupric-complexed form of humic acids is more refractory than the non-complexed one.     

O3/H2O2/UV降解1,2,4-三氯苯的研究

采用O3/H2O2/UV工艺处理1,2,4-三氯苯(TCB)模拟废水,考察了TCB初始浓度、pH、H2O2投加量及O3转化率等因素对O3/H2O2/UV降解TCB的影响,推断了TCB可能的降解途径。结果表明:(1)H2O2、O3、UV、O3/H2O2、O3/H2O2/UV 5种体系对TCB的降解效果为H2O2相似文献   

UV/H2O2协同光降解处理酒石酸镍废水

含镍电镀废水中酒石酸的存在,使得废水中总镍无法通过化学沉淀法去除,无法满足达标排放要求。采用UV/H2O2光降解法处理酒石酸镍体系废水,考察了不同反应pH值、过氧化氢投加量、光照时间对酒石酸镍体系络合废水的处理效果。实验结果表明：UV/H2O2法对酒石酸镍体系废水有很好的协同处理效果,光降解过程呈拟一级动力学过程;优化的酒石酸镍废水处理工艺为反应pH值3.0,30%过氧化氢投加量2 mL·L-1,15 W功率紫外灯光照下反应120 min,在优化的工艺条件下,采用化学沉淀法去除水中镍,处理后电镀废水中总镍可满足《电镀污染物排放标准》（GB 21900-2008）中0.5 mg·L-1要求。     

臭氧/双氧水/紫外光联用降解饮用水中溴氯乙腈的试验研究

为减少饮用水氯化消毒过程中产生的含氮消毒副产物溴氯乙腈(BCAN),降低其潜在的致癌风险,分别采用臭氧(O3)、双氧水(H2O2)和紫外光(UV)及其联合工艺,考察了不同试验条件下BCAN的降解效果及影响因素,并探讨了其降解机制和动力学规律。结果表明,O3、H2O2和UV工艺对BCAN降解效果都不理想,UV/H2O2和UV/H2O2/O3联合工艺可以较有效地降解水中的BCAN。在BCAN初始质量浓度为20μg/L、紫外光强为31μW/cm2、H2O2质量浓度为40 mg/L、O3质量浓度为7.9mg/L条件下,反应进行120min后,UV/H2O2联合工艺与UV/H2O2/O3联合工艺对BCAN的降解率分别为77.50%、94.05%。UV/H2O2/O3联合工艺对BCAN的降解效果比UV/H2O2联合工艺更好,UV/H2O2和UV/H2O2/O3联合工艺降解BCAN均符合一级反应动力学规律。     

UV/H2O2/Fe-FeOxH2x-3和UV/H2O2工艺降解水中富里酸的研究

采用硼氢化钠还原法制备核-壳结构的Fe-FeOxH2x-3复合材料,研究了富里酸在UV/H2O2和UV/H2O2/Fe-FeOxH2x-3两种不同反应体系下的降解情况。结果表明,核-壳结构Fe-FeOxH2x-3的存在,提高了UV/H2O2降解富里酸的反应速率,TOC去除达到84%。采用XAD树脂吸附法对反应前后的富里酸进行化学分级表征,结果表明,富里酸经反应后憎水酸（HoA）、弱憎水酸（WHoA）和憎水中性物质（HoN）都有所减少,进而转化为亲水性物质（HiM）;用超滤膜法对富里酸进行物理分级表征,考察了富里酸在反应前后分子量分布的变化情况。同时,富里酸经过反应后生成的中间产物降低了三氯甲烷生成趋势。     

Photochemical degradation of atrazine in UV and UV/H2O2 process: pathways and toxic effects of products

The degradation of atrazine in aqueous solution by UV or UV/H₂O₂ processes, and the toxic effects of the degradation products were explored. The mineralization of atrazine was not observed in the UV irradiation process, resulting in the production of hydroxyatrazine (OIET) as the final product. In the UV/H₂O₂ process, the final product was ammeline (OAAT), which was obtained by two different pathways of reaction: dechlorination followed by hydroxylation, and the de-alkylation of atrazine. The by-products of the reaction of dechlorination followed by hydroxylation were OIET and hydroxydeethyl atrazine (OIAT), and those of de-alkylation were deisopropyl atrazine (CEAT), deethyl atrazine (CIAT), and deethyldeisopropyl atrazine (CAAT). OIAT and OAAT appeared to be quite stable in the degradation of atrazine by the UV/H₂O₂ process. In a toxicity test using Daphnia magna, the acute toxic unit (TUa) was less than 1 of TUa (100/EC₅₀, %) in the UV/H₂O₂ process after 30 min of reaction time, while 1.2 to 1.3 of TUa was observed in the UV process. The TUa values of atrazine and the degradation products have the following decreasing order: OIET> Atrazine> CEAT≈CIAT> CAAT. OIAT and OAAT did not show any toxic effects.     

Modeling the quantum yields of herbicide 2,4-D decay in UV/H2O2 process

The photodecay of herbicide 2,4-D in a hydrogen peroxide-aided photolysis process was studied and modeled. The decay rate of 2,4-D was known to be low in the natural environment, but rate improvement was achieved in an H2O2/UV system. The 2,4-D decay quantum yields under ultraviolet (UV) light at 253.7 nm increased from 4.86 x 10(-6) to 1.30 x 10(-4) as the ratio of [H2O2]/[2,4-D] increased from 0.05 to 12.5. Apparently, in the presence of UV light, the decay rate of 2,4-D could be greatly improved as the concentration of hydrogen peroxide increased. However, the efficiency of 2,4-D photodecay was retarded if the concentration of H2O2 was overdosed, because the excess hydrogen peroxide consumes the hydroxyl radicals (HO*) in the solution, resulting in a much weaker oxidant HO2*. The decay of 2,4-D was also pH dependent. A ranking of acid (highest), base (middle) and neutral (lowest) was observed owing to the property change of reactants and the shifting of dominant mechanisms among photolysis, photohydrolysis and chemical oxidation. Two mathematical models were proposed to predict the quantum yield for various [H2O2]/[2,4-D] ratios and initial pH levels, in which very good correlation was found for the ranges of regular application.     

Photochemical degradation of ciprofloxacin in UV and UV/H2O2 process: kinetics, parameters, and products

Photochemical degradation of fluoroquinolone ciprofloxacin (CIP) in water by UV and UV/H₂O₂ were investigated. The degradation rate of CIP was affected by pH, H₂O₂ dosage, as well as the presence of other inorganic components. The optimized pH value and H₂O₂ concentration were 7.0 and 5 mM. Carbonate and nitrate both impeded CIP degradation. According to liquid chromatography–tandem mass spectrometry analysis, four and 16 products were identified in UV and UV/H₂O₂ system, respectively. Proposed degradation pathways suggest that reactions including the piperazinyl substituent, quinolone moiety, and cyclopropyl group lead to the photochemical degradation of CIP. Toxicity of products assessed by Vibrio qinghaiensis demonstrated that UV/H₂O₂ process was more capable on controlling the toxicity of intermediates in CIP degradation than UV process.     

Oxidation of MCPA and 2,4-D by UV radiation, ozone, and the combinations UV/H2O2 and O3/H2O2

The phenoxyalkyl acid derivative herbicides MCPA (4-chloro 2-methylphenoxyacetic acid) and 2,4-D (2,4-dichlorophenoxyacetic acid) were oxidized in ultrapure water by means of a monochromatic UV irradiation and by ozone, as well as by the combinations UV/H2O2 and O3/H2O2. In the direct photolysis of MCPA, the quantum yield at 20 degrees C was directly evaluated and a value of 0.150 mol Eins(-1) was obtained in the pH range 5-9, while a lower value of 0.41 x 10(-2) mol Eins(-1) was determined at pH=3. Similarly, for 2,4-D a value of 0.81 x 10(-2) mol Eins(-1) was deduced, independent of the pH of work. The influence of the additional presence of hydrogen peroxide was established in the combined process UV/H2O2, and the specific contribution of the radical pathway to the global photo-degradation was evaluated. The oxidation by ozone and by the combination O3/H2O2 was also studied, with the determination of the rate constants for the reactions of both herbicides with ozone and hydroxyl radicals at 20 degrees C. These rate constants for the direct reactions with ozone were 47.7 and 21.9 M(-1) s(-1) for MCPA and 2,4-D respectively, while the found values for the rate constants corresponding to the radical reactions were 6.6 x 10(9) and 5.1 x 10(9) M(-1) s(-1).     

Experimental and numerical study of methylparaben decomposition in aqueous solution using the UV/H2O2 process

The present paper aims at presenting a kinetic model that is supposed to result in the decomposition of methylparaben in completely mixed batch reactor (CMBR) using the UV/H₂O₂ process. The proposed model incorporates photochemical, chemical reactions and their constant rates to formulate the overall kinetic rate expressions which are integrated into MATLAB. Thus, the changes in pH values during the process of oxidation are taken into consideration. In addition, the effects of hydrogen peroxide (HP) dosage, as well as the concentration of hydroxyl radicals, are examined. Accordingly, the pseudo-first-order rate constant, its variation as functions of HP concentration, incident UV-light intensity and the limitations of the adopted approach are discussed. In line with that, the authors provided evidence of the validity of the kinetic model through the exposure of previous experimental studies as reported in the literature review then through the evidence of the present experimental data.     

Degradation of bisphenol A by the UV/H2O2 process: a kinetic study

A theoretical and experimental study of bisphenol A (BPA) degradation by the UV/H₂O₂ process in water is presented. The effects of the H₂O₂ concentration and the specific rate of photon emission (E_P,0) on BPA degradation were investigated. A kinetic model derived from a reaction sequence was employed to predict BPA and hydrogen peroxide concentrations over time using an annular photochemical reactor in batch recirculation mode. The local volumetric rate of photon absorption (LVRPA) inside the photoreactor was computed using a Line Source with Parallel Plane emission model (LSPP). From the proposed kinetic model and the experimental data, the second order rate constants of the reactions between hydroxyl radicals and the main reacting species (H₂O₂ and BPA) were estimated applying a nonlinear regression method. A good agreement between the kinetic model and experimental data, for a wide range of operating conditions, was obtained. For BPA, H₂O₂, and TOC concentrations, the calculated root means square errors (RMSE) were 2.3?×?10^??2, 9.8?×?10^??1, and 9.0?×?10^??2 mmol L^??1, respectively. The simplified kinetic model presented in this work can be directly applied to scaling-up and reactor design, since the estimated kinetic constants are independent of the reactor size, shape, and configuration. Further experiments were made by employing low BPA initial concentration (100 μg L^??1) in water and real wastewater. A lower degradation rate of BPA was observed in the real wastewater, although the UV/H₂O₂ process has also been able to completely degrade the target pollutant in less than 1 h.

     

Degradation of bisphenol A using UV and UV/H2O2 processes

Bisphenol A (BPA; 4-[2-(4-hydroxyphenyl)propan-2-yl]phenol) is a substance typically used in the plastic industry. It is used in the production of epoxy resins, polycarbonate, or fire retardants or as a stabilizer and an antioxidant in numerous types of plastics. Bisphenol A is introduced into the environment via municipal and industrial wastewater. Because of its hydrophobic properties, BPA has the potential for sorption on activated sludge during the biological wastewater treatment processes. This study investigated the degradation of BPA by means of UV-radiation and in the UV/H2O2 process with the presence and absence of hydrocarbonate ions (HCO3(-)) as hydroxyl radicals (OH*) scavengers. The calculated value of quantum yield was equal to 0.18, and the value of BPA rate constant with hydroxyl radicals was equal to 3.3 x 10(9) M(-1) s(-1).     

TiO2/H2O2/UV和TiO2/O3/UV降解对氯苯甲酸和喹啉的试验研究

主要叙述TiO2/H2O2/UV和TiO2/O3/UV体系降解对氯苯甲酸(4-CBA)和喹啉的试验研究.研究表明,(1)在TiO2/H2O2/UV体系里目标物降解速度先随过氧化氢投加量的增加而提高,但超过一定浓度之后便开始下降;(2)在TiO2/O3/UV体系中,目标降解物的反应速度都非常快,且臭氧浓度高的时候降解速度更快;(3)二氧化钛催化剂在TiO2/O3/UV体系中作为积极因素有助于提高反应速率,而在TiO2/H2O2/UV体系是消极因素,会降低反应速率.     

TiO2/H2O2/UV和TiO2/O3/UV降解对氯苯甲酸和喹啉的试验研究

主要叙述TiO2/H2O2/UV和TiO2/O3/UV体系降解对氯苯甲酸（4-CBA）和喹啉的试验研究.研究表明,（1）在TiO2/H2O2/UV体系里目标物降解速度先随过氧化氢投加量的增加而提高,但超过一定浓度之后便开始下降;（2）在TiO2/O3/UV体系中,目标降解物的反应速度都非常快,且臭氧浓度高的时候降解速度更快;（3）二氧化钛催化剂在TiO2/O3/UV体系中作为积极因素有助于提高反应速率,而在TiO2/H2O2/UV体系是消极因素,会降低反应速率.     

UV/草酸铁/H2O2法处理乙草胺废水的研究

对UV/草酸铁/H2O2法处理乙草胺废水进行研究,考察了H2O2浓度、FeSO4浓度、K2C2O4浓度、pH值及反应时间对乙草胺去除效果的影响.结果表明,当H2O2/FeSO4/K2C2O4(化学剂量数比)=5051,H2O2/乙草胺初始COD(质量浓度比)=31时,该技术对乙草胺的去除率可达85%以上.这表明,采用UV/草酸铁/H2O2法可以有效地处理含乙草胺废水.     

O3、H2O2／O3及UV／O3在焦化废水深度处理中的应用

采用O3、H2O2／O3及UV／O3等高级氧化技术（AOPs）对某焦化公司的生化出水进行深度处理,考察了O3与废水的接触时间、溶液pH、反应温度等因素对废水COD去除率的影响,确定出O3氧化反应的最佳工艺参数为：接触时间40min,溶液pH8．5,反应温度25℃,此条件下废水COD及UV254的去除率最高可达47．14％和73．47％;H2O2／O3及UV／O3两种组合工艺对焦化废水COD及UV254的去除率均有一定程度的提高,但H2O2／O3系统的运行效果取决于H2O2的投加量。研究结论表明,单纯采用COD作为评价指标,并不能准确反映出O3系列AOPs对焦化废水中有机污染物的降解作用。     

UV/H2O2工艺降解典型消炎药布洛芬影响因素和降解机理

布洛芬是一种典型药物和个人护理用品（PPCPs）,大量生产和广泛使用给环境带来了一定危害。基于响应面方法,采用UV/H2O2工艺降解布洛芬（IB）,对降解过程中的影响因素（光强、H2O2投加量、初始IB浓度）进行了探讨,构建响应面模型。优化的最佳反应条件为：H2O2投加量0.10 mol·L-1、初始IB浓度5.00 mg·L-1、UV光强1 400 μW·cm-2,预测和实验IB以及反应动力学速率常数接近,说明响应面模型能够有效描述UV/H2O2降解反应过程。同时用离子阱质谱仪鉴定出IB羟基加成物、4-乙基苯酚、对异丁基苯甲酸等降解中间产物,其中IB羟基加成物的细胞毒性大于IB本身,最后提出降解机理。本研究为UV/H2O2工艺降解典型消炎药类污染物提供技术参考。     

UV/H2O2/草酸铁络合物光降解邻苯二甲酸二丁酯研究

研究了邻苯二甲酸二丁酯(DBP)在UV/H2O2/草酸铁络合物体系中的光降解.结果表明,UV/H2O2/草酸铁络合物能有效地光解DBP;在pH值为4时,DBP光解速率最快,中性和碱性条件下光解效率降低;DBP的光解速率随H2O2浓度的升高而增大,但H2O2浓度较大时,其对·OH的清除作用使DBP的光解速率减慢;[Fe3 ]/[C2O42]＜1/10,DBP光解速率随Fe3 浓度增大明显提高,[Fe3 ]/[C2O42]＞1/10时,引起DBP光解速率的增加不明显.