湖北省湖库洪水调蓄能力及其空间分异特征

湖泊是抵御湖区水系洪水灾害的天然屏障,而水库是现代防洪工程体系的重要组成部分,两者共同肩负着防洪减灾的重任。为探明湖北省湖库洪水调蓄能力,选取湖泊可调蓄水量、水库防洪库容作为评估指标,通过构建湖库洪水调蓄能力评估模型,分析全省湖库洪水调蓄能力及空间分异特征。结论如下：（1）湖北省湖泊、水库综合洪水调蓄量为416.02×108m3,其中湖泊可调蓄水量为79.69×108m3,水库防洪库容为336.33×108m3,分别占湖库洪水调蓄功能总量的19.16%和80.84%;（2）湖泊可调蓄水量较大的地区包括武汉、荆州、鄂州、黄石等地市以及鄂东丘陵、江汉平原,而单位面积湖泊调蓄洪水能力较强的地区为鄂州、黄石、咸宁、黄冈,其值分别为405.99×104、400.31×104、392.32×104和391.22×104m3/km2;（3）水库防洪库容较大的地区主要为鄂西山地的宜昌和十堰,分别为119.18×108m3和 103.03×108m3,占全省防洪库容总量的66.06%,而鄂州、天门和神农架水库防洪库容极小,不足全省水库总防洪库容的1%;（4）湖库综合调蓄能力空间分布特征与水库洪水调蓄能力空间分布相一致;从湖泊、水库洪水调蓄能力的构成来看,以湖泊防洪为主和以水库防洪为主的地市不相上下,水库在湖北省防洪体系中占绝对主体地位,同时湖泊也发挥着不可或缺的作用。针对湖泊萎缩、水库险病等突出问题,可以通过退田还湖、除险加固等工作提高湖库综合调洪能力。本研究可为湖北省湖库防洪建设提供科学指导。关键词： 湖泊;水库;洪水调蓄功能;空间分异;湖北省     

超声波强化污水厌氧生物处理综述

通过对超声波辐射促进微生物活性以及超声波强化污水好氧生物处理、厌氧污泥减量化处理等作用机制的分析研究,探讨将超声波应用于强化污水厌氧生物处理的可行性.同时对超声波强化污水厌氧生物处理的应用前景进行了展望.     

仓面浇筑立体空间冲突致灾过程建模与伤害评价*

为定量评价大坝浇筑过程空间冲突致灾事故后果,通过对缆机运输典型情景进行危害能量运动分解,确定在水平和竖直方向运动方式,阐述危害能量在流动路径相互转化形式;根据能量守恒定律,分析危害能量在吊罐与承灾体碰撞接触之间转移规律,将吊罐与人头部接触过程抽象为带强阻尼的弹簧振子系统,建立危害能量与碰撞冲量相等的动量方程,量化空间冲突致灾后果。结果表明:吊罐坠落危害能量极大,产生的碰撞冲击力与吊罐的运输速度、高度呈正相关,与阻力系数呈负相关,风速、载重对其影响较大。对比2种不同碰撞情景发现,机械碰撞因顶部承载力缓冲,对人头部产生伤害远小于直接碰撞,并对碰撞结果分级评价,研究结果可为大坝浇筑交叉作业空间冲突致灾风险评价提供参考。     

厌氧-好氧一体化反应器处理高浓度有机废水的运行特性研究

本实验采用新型厌氧—好氧一体化反应器处理高浓度有机废水,主要研究了系统的启动与运行性能,并对系统的NH3 N去除效果作了初步考察。实验结果表明:在16℃～24℃的自然温度下,采用递增负荷、厌氧和好氧分期启动的方式,系统可在38天内达到较好的启动效果;在系统负荷运行期内,当系统总进水COD浓度平均值为3601 8mg/L,总出水COD浓度平均值为384 0mg/L,系统容积负荷平均值为2 54kgCOD/(m3·d),系统总HRT平均值为35 1h时,系统总COD去除率平均值达90 6%。实验还发现:当进水NH3 N浓度为280 3～350 7mg/L,整个系统的NH3 N去除率在68 5%～91 7%,平均为81 0%。由此说明,本反应器具有很好的COD去除性能和NH3 N去除效果,适合于处理COD浓度高且含有中等NH3 N浓度的有机废水。     

含镍废催化剂的回收利用

介绍了从含镍废催化剂中以硝酸镍形式加收镍的方法，镍回收率为70％，硝酸镍纯度为96．6％。该工艺简单，具有较好的经济效益和环境效益。     

可溶性有机物对土壤中主要有机污染物环境行为的影响

概括了环境中可溶性有机物的特点，并系统总结了当前国内外关于可溶性有机物对土壤中主要污染物环境行为的影响的研究进展。阐述了可溶性有机物对农药、多环芳烃在土壤中的吸附、解吸及分配等环境行为所起的作用。最后指出了该方面研究存在的问题及今后应加强的方向。     

基于GTST-MLD的机场安检系统风险分析

机场安检系统是保障航空安全的重要环节,安检系统安全可靠地运行取决于多种因素.安检系统各组成部分安全风险的关联关系和各要素交互作用的信息可以被目标树-成功树(GTST)和主逻辑图(MLD)的建模方法完整地描述.论述了GTST-MLD模型的特点及其建模步骤,并且将它们运用到安检系统的风险分析上,解决了安检系统的安全风险模型建立的问题.     

单甲脒农药对模型池塘生态系统藻类群落结构的影响

在１．５－５０．０ｍｇ／Ｌ的浓度范围内，单甲脒农药对模型池塘生态系统中的浮游植物群落结构有明显影响。尤其在加药的头４ｄ内，藻类种类、数量、多样性指数、种类数比及增长率明显下降，优势比显著上升，敏感种及清洁种减少甚至消失，高浓度（５０．０ｍｇ／Ｌ）的单甲脒在２ｄ内可把藻类全部杀灭。随试验时间的延长，药物不断降解，６ｄ后藻类种类、数量、多样性指数又不断回升。随加药次数的增多，药物对藻类抑制作用明显减弱，藻类的种类、数量、多样性指数等指标不断上升，尤其是藻类数量增加明显，试验后期，藻类数量高低主要受Ｎ、Ｐ浓度大小的影响。     

Accumulation of butyl- and phenyltin compounds in starfish and bivalves from the coastal environment of Korea

Triphenyltin (TPT) and tributyltin (TBT) concentrations were determined in two starfish species (Asteria pectinifera and Asterias amurensis), bivalves (Crassostrea gigas or Mytilus edulis), and seawater samples from sites around the coasts of Korea. Both TPT and TBT concentrations in starfish ranged from 8 to 1560 ng/g and from <2 to 797 ng/g as Sn on a dry weight basis, respectively. TPT concentration accounted for 75.4% and 86.4% of total phenyltin concentration in A. pectinifera and A. amurensis, respectively, while monobutyltin, a degradation product of TBT, accounted for 86.3% and 57.2% of total butyltin, respectively. Triphenyltin concentrations in A. pectinifera were significantly correlated to water and bivalve TPT concentrations, which implies that dietary uptake of TPT from contaminated prey as well as direct uptake from surrounding water contribute to TPT body residues in the starfish. Starfish could be target organisms for monitoring TPT compound in the marine environment, due to their high accumulation and low degradation capacity towards TPT.     

Emission factors of air toxics from semiconductor manufacturing in Korea

The development of local, accurate emission factors is very important for the estimation of reliable national emissions and air quality management. For that, this study is performed for pollutants released to the atmosphere with source-specific emission tests from the semiconductor manufacturing industry. The semiconductor manufacturing industry is one of the major sources of air toxics or hazardous air pollutants (HAPs); thus, understanding the emission characteristics of the emission source is a very important factor in the development of a control strategy. However, in Korea, there is a general lack of information available on air emissions from the semiconductor industry. The major emission sources of air toxics examined from the semiconductor manufacturing industry were wet chemical stations, coating applications, gaseous operations, photolithography, and miscellaneous devices in the wafer fabrication and semiconductor packaging processes. In this study, analyses of emission characteristics, and the estimations of emission data and factors for air toxics, such as acids, bases, heavy metals, and volatile organic compounds from the semiconductor manufacturing process have been performed. The concentration of hydrogen chloride from the packaging process was the highest among all of the processes. In addition, the emission factor of total volatile organic compounds (TVOCs) for the packaging process was higher than that of the wafer fabrication process. Emission factors estimated in this study were compared with those of Taiwan for evaluation, and they were found to be of similar level in the case of TVOCs and fluorine compounds.