负载型TiO2/活性炭的制备及光催化降解罗丹明B研究

通过溶胶-凝胶方法以活性炭(AC)为载体,制备负载型TiO2/AC,利用SEM、BET、XRD、Ranme、XPS对TiO2/AC的组成、结构、尺寸等特征进行分析和表征,并用紫外灯为光源,通过TiO2/AC、TiO2粉末和活性炭与TiO2粉末的混合物对可溶性罗丹明B的光催化降解效果的比较,探讨了TiO2/AC的光催化性能.结果表明,负载体中的TiO2是由30～60nm的球形颗粒组成,含有Ti,O,C等3种元素,颗粒间不发生团聚,其中一些C元素是由活性炭载体扩散到TiO2颗粒中的.由于活性炭载体与TiO2的协同作用以及高浓度Ti3+的影响,负载型TiO2/AC的光催化活性大.当TiO2/AC在250℃空气中热处理2h,再在氮气保护下500℃热处理2 h,TiO2的质量分数为(18±0.3)%时,负载型TiO2/AC对罗丹明B的光催化降解的表观反应常数k最大,为0.0077 min-1.     

UV/H2O2体系光降解邻苯二甲酸二丁酯研究

研究了邻苯二甲酸二丁酯(DBP)在UV/H₂O₂体系中的光降解.结果表明:DBP在UV/H₂O₂体系中能很好地降解,且其光降解速率大于在单一UV辐照下的光降解速率;在pH为中性条件下DBP的光降解速率最快,而在强酸性或碱性条件下DBP的光降解速率均较低;在一定H₂O₂浓度范围内,DBP的光降解速率随c(H₂O₂)的升高而增大,但当c(H₂O₂)过高时,其对·OH自由基的清除作用使DBP的光降解速率减慢.DBP的光降解速率随其初始质量浓度的增大而降低;在实验质量浓度范围内,DBP的光降解速率常数近似与其初始质量浓度成负一级反应动力学关系.      

TiO_2/beads as a photocatalyst for the degradation of X_(3B) azo dye

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DBP formation from degradation of DEET and ibuprofen by UV/chlorine process and subsequent post-chlorination

The formation of disinfection by-products(DBPs) from the degradation of N,N-diethyl-3-methyl benzoyl amide(DEET) and ibuprofen(IBP) by the ultraviolet irradiation(UV)/chlorine process and subsequent post-chlorination was investigated and compared with the UV/H_2O_2 process.The pseudo first-order rate constants of the degradation of DEET and IBP by the UV/chlorine process were 2 and 3.1 times higher than those by the UV/H_2O_2 process, respectively, under the tested conditions. This was due to the significant contributions of both reactive chlorine species U(RCS) and hydroxyl radicals(HO) in the UV/chlorine process. Trichloromethane, 1,1,1-trichloro-2-propanone and dichloroacetic acid were the major known DBPs formed after 90% of both DEET and IBP that were degraded by the UV/chlorine process. Their yields increased by over 50%after subsequent 1-day post-chlorination. The detected DBPs after the degradation of DEET and IBP comprised 13.5% and 19.8% of total organic chlorine(TOCl), respectively, and the proportions increased to 19.8% and 33.9% after subsequent chlorination, respectively. In comparison to the UV/H_2O_2 process accompanied with post-chlorination, the formation of DBPs and TOCl in the UV/chlorine process together with post-chlorination was 5%–63% higher,Ulikely due to the generation of more DBP precursors from the attack of RCS, in addition to HO.     

一种改进型电凝聚器降解X-3B染料废水研究

采用自制改进型电凝聚器处理模拟X-3B染料废水,考察了不同的电流强度、搅拌速率、倒极频率、进水pH、废水初始浓度浓度对染料色度去除率的影响,并对搅拌速率对絮体沉降率的影响也做了相关研究.在综合处理效果与经济因素下,该反应器处理染料废水最佳条件为:电流强度I=4 A,初始pH=7,C(NaC1)=2g/L,搅拌速率80r...     

浅谈V型滤池的工艺设计

介绍了V型滤池工艺特点,总结了V型滤池的工艺设计、施工安装和生产管理工作体会.     

电-Fenton法中H2O2生成量影响因素研究

研究电压、pH值、支持电解质、极板间距对电-Fenton法产生H2O2量的影响,确定本实验的最佳状态值.实验以调节电压、pH值、支持电解质、极板间距因素为主,并以草酸钛钾比色法来确定各因素在最佳状态下的产H2O2量.结果表明,在电压15 V、pH值为3 左右、支持电解质投加量为10 g/L、极板间距10 cm时产生H2O2的量最合适,产生H2O2的量能够满足电-Fenton法处理难降解有机物废水的要求.     

催化铁内电解反应床对水中酸性红B的脱色研究

在铁内电解法的基础上发展出的铁镀铜滤料构成的催化铁内电解反应床,并以酸性红B为目标染料,研究了催化铁内电解反应床的脱色性能。结果表明,在不同初始pH条件下,催化铁内电解反应床对水中酸性红B的脱色效果均优于单一铁内电解反应床。在水力停留时间为2 h,进水pH值为7.2,汽水比为1∶30的条件下,催化铁内电解反应床对100 mg/L酸性红B的平均脱色率为88.5％,高于单一铁内电解反应床约9％。另外,适当增加曝气可以增加铁内电解反应床的脱色效果。     

Synthesis and antifungal activity of 2H-1,4-benzoxazin-3(4H)-one derivatives

A series of 2-alkyl-2H-1,4-benzoxazin-3(4H)-ones (4a-l) was easily synthesized by two-step process involving O-alkylation of 2-nitrophenols with methyl 2-bromoalkanoates and next “green” catalytic reductive cyclization of the obtained 2-nitro ester intermediates (3a-l). Further, 6,7-dibromo (5a-c) and N-acetyl (6) derivatives were prepared by bromination and acetylation of unsubstituted 2-alkyl-2H-1,4-benzoxazin-3(4H)-ones (4a-c). The novel compounds (3a-l, 4d-l, 5a-c and 6) were fully characterized by spectroscopic methods (MS, ¹H and ¹³C NMR). 2-Alkyl-2H-1,4-benzoxazin-3(4H)-ones (4a-l, 5a-c and 6) were screened for antifungal activity. Preliminary assays were performed using two methods: in vitro against seven phytopathogenic fungi—Botrytis cinerea, Phythophtora cactorum, Rhizoctonia solani, Phoma betae, Fusarium culmorum, Fusarium oxysporum and Alternaria alternata—and in vivo against barley powdery mildew Blumeria graminis. The tested compounds displayed moderate to good antifungal activity at high concentration (200 mg L^?1). The most potent compounds were 2-ethyl-2H-1,4-benzoxazin-3(4H)-one (4a), 2-ethyl-7-fluoro-2H-1,4-benzoxazin-3(4H)-one (4g) and 4-acetyl-2-ethyl-2H-1,4-benzoxazin-3(4H)-one (6), which completely inhibited the mycelial growth of seven agricultural fungi at the concentration of 200 mg L^?1 in the in vitro tests. Moreover, 2-ethyl-2H-1,4-benzoxazin-3(4H)-one (4a) and 4-acetyl-2-ethyl-2H-1,4-benzoxazin-3(4H)-one (6) were also screened for antifungal activity at concentrations of 100 mg L^?1 and 20 mg L^?1. In the concentration of 100 mg L^?1, the N-acetyl derivative (6) completely inhibited the growth of three strains of fungi (F. culmorum, P. cactorum and R. solani), while 2-ethyl-2H-1,4-benzoxazin-3(4H)-one (4a) completely inhibited only R. solani strain. At the concentration of 20 mg L^?1, compound 6 showed good activity only against P. cactorum strain (72%).     

Nano-textured polysilicon solar absorption films

Nano-textured polysilicon (poly-Si) solar absorption films are to be applied to the solar receiver of solar thermal electricity Stirling engine. These films were fabricated by deposition of hydrogenated amorphous silicon films (a-Si:H) into poly-Si films, using the pulse-wave modulation plasma and furnace annealing of the a-Si:H films. This is followed by wet etching of poly-Si films into nano-textured structures. The films are then coated with a-SiN_x:H films as the antireflection and protection layers. It was observed that increasing the pulsed plasma turn-on (t_on) time leads to deposition of less dense a-Si:H film with high hydrogen content and void density. This results in films having low dielectric constant and refractive index, and high optical bandgap. Less-dense a-Si:H film can be transferred into large grain size poly-Si film, using annealing. Also, highly rough nano-textured surface structure can be produced, by etching. The denser a-Si:H film, large grain size poly-Si film, and nano-textured surface poly-Si film can enhance the absorbance of sunlight and reduce the emissivity of far infrared light. The nano-textured poly-Si film coated with an a-SiN_x:H layer can effectively increase the absorbance of sunlight to approximately 85% and reduce the emissivity of far infrared light to 49%. The nano-textured poly-Si/a-SiN_x:H films can be used as efficient solar absorption films for solar thermal electricity Stirling engine.