Degradation of the pharmaceutical metronidazole via UV, Fenton and photo-Fenton processes

Degradation rates and removal efficiencies of Metronidazole using UV, UV/H2O2, H2O2/Fe2+, and UV/H2O2/Fe2+ were studied in de-ionized water. The four different oxidation processes were compared for the removal kinetics of the antimicrobial pharmaceutical Metronidazole. It was found that the degradation of Metronidazole by UV and UV/H2O2 exhibited pseudo-first order reaction kinetics. By applying H2O2/Fe2+, and UV/H2O2/Fe2+ the degradation kinetics followed a second order behavior. The quantum yields for direct photolysis, measured at 254 nm and 200-400 nm, were 0.0033 and 0.0080 mol E(-1), respectively. Increasing the concentrations of hydrogen peroxide promoted the oxidation rate by UV/ H2O2. Adding more ferrous ions enhanced the oxidation rate for the H2O2/Fe2+ and UV/H2O2/Fe2+ processes. The major advantages and disadvantages of each process and the complexity of comparing the various advanced oxidation processes on an equal basis are discussed.     

Effect of various reaction parameters on THMs aqueous sonolysis

Ultrasonic irradiation was investigated for destruction of the following THMs: CHCl(3), CHBrCl(2), CHBr(2)Cl, CHBr(3), and CHI(3). The effect of pH, temperature, and the organics initial concentration on the THMs sonodegradation at acoustic frequency of 20 kHz was studied. An increase of the solution temperature resulted in a faster sonodegradation rates. Initial aqueous solution pH, in the range from 3 to 10, was found to have little effect on the degradation of the THMs. The THMs sonolysis efficiency was reduced when the initial organic compounds concentration was increased from 10 mg l(-1) to 300 mg l(-1).