紫外辐射下的生物降解及微生物群落的变化

分别采用一体式循环床紫外光/生物膜反应器（PCBBR）和气升式内循环的紫外光/生物膜反应器（ILPBR）,用于苯酚、2,4,6-三氯酚（TCP）和抗生素药物磺胺甲恶唑（SMX）的降解.结果表明,苯酚、TCP和SMX在紫外光解与生物降解的共同作用下,其去除速率分别达到0.65、0.11和0.17 mg.（L.min）–1...     

纳米核壳Co@NC催化剂活化过氧乙酸降解磺胺甲噁唑

过氧乙酸[PAA,CH₃C(O)OOH]作为一种新兴的氧化剂,在处理污水中难降解有机污染物中受到了越来越多的关注.通过蚀刻方法制备出纳米核壳Co@NC催化剂,并将其用于活化PAA降解污水中磺胺甲■唑(SMX).结果表明,当控制催化剂投加量为0.02 g·L^-1、PAA浓度为0.12mmol·L^-1和SMX浓度为10μmol·L^-1时,反应5 min时SMX的去除率即可达到98%,且降解SMX的速率常数为0.80 min^-1.SMX降解效率随催化剂添加量和PAA浓度提高而显著增加.结果发现核壳Co@NC/PAA体系在近中性条件下(pH为6.0～8.0)可获得最佳的SMX降解效果,酸性或碱性条件均不利于SMX去除.HCO^-₃和腐殖酸对该催化体系存在显著抑制,而Cl^-抑制作用较弱.此外,通过自由基淬灭实验和电子顺磁共振(EPR)研究发现,乙酰氧自由基(CH₃CO₂·)和乙酰过...     

Micropollutant removal and disinfection byproduct control by sequential peroxymonosulfate-UV treatment in water: A case study with sulfamethoxazole

UV/peroxymonosulfate (UV/PMS) advanced oxidation process has attracted significant attention for removal of micropollutants in water. However, during practical water treatment applications, the PMS treatment must be performed before the UV treatment to achieve full contact. In this study, sulfamethoxazole (SMX) was selected as the target micropollutant. Four different operational approaches, including UV alone, PMS alone, simultaneous UV/PMS and sequential PMS-UV, were compared for their differences in SMX removal and disinfection by-product (DBP) formation potentials during chlorine-driven disinfection. Among the four approaches, UV/PMS and PMS-UV achieved over 90% removal efficiencies for SMX without substantial differences. For raw water, the trichloronitromethane (TCNM) formation potential after treatment with PMS-UV was lower than that after UV/PMS treatment. The time interval over which the PMS-UV process was conducted had little effect on the final removal efficiency for SMX. However, a brief (5 min) pre-PMS treatment significantly reduced the TCNM formation potential and the genotoxicity from DBPs. The formation risk for TCNM during chlorination increased markedly with increasing PMS dosages, and the appropriate dosage under these experimental conditions was suggested to be 0.5–1.0 mmol/L. Under alkaline conditions, PMS-UV treatment can enhance SMX degradation as well as dramatically reduced the formation potentials for haloketones, haloacetonitriles and halonitromethanes. This study suggests that proper optimization of UV/PMS processes can remove SMX and reduce its DBP formation.     

Removal of antibiotics in a parallel-plate thin-film-photocatalytic reactor: Process modeling and evolution of transformation by-products and toxicity

Photocatalytic degradation of sulfamethoxazole(SMX) antibiotic has been studied under recycling batch and homogeneous flow conditions in a thin-film coated immobilized system namely parallel-plate(PPL) reactor. Experimentally designed, statistically evaluated with a factorial design(FD) approach with intent to provide a mathematical model takes into account the parameters influencing process performance. Initial antibiotic concentration, UV energy level, irradiated surface area, water matrix(ultrapure and secondary treated wastewater) and time, were defined as model parameters. A full of 2~5 experimental design was consisted of 32 random experiments. PPL reactor test experiments were carried out in order to set boundary levels for hydraulic, volumetric and defined defined process parameters. TTIP based thin-film with polyethylene glycol + TiO_2 additives were fabricated according to pre-described methodology. Antibiotic degradation was monitored by High Performance Liquid Chromatography analysis while the degradation products were specified by LC–TOF-MS analysis. Acute toxicity of untreated and treated SMX solutions was tested by standard Daphnia magna method. Based on the obtained mathematical model, the response of the immobilized PC system is described with a polynomial equation. The statistically significant positive effects are initial SMX concentration,process time and the combined effect of both, while combined effect of water matrix and irradiated surface area displays an adverse effect on the rate of antibiotic degradation by photocatalytic oxidation. Process efficiency and the validity of the acquired mathematical model was also verified for levofloxacin and cefaclor antibiotics. Immobilized PC degradation in PPL reactor configuration was found capable of providing reduced effluent toxicity by simultaneous degradation of SMX parent compound and TBPs.     

UV/TiO2去除水中磺胺甲 唑的动力学及影响因素分析

采用UV/TiO2工艺去除磺胺甲 唑(SMX),研究了SMX在纳米TiO2(Degussa P-25)悬浆体系中的光催化去除效果,考察了TiO2投加量、SMX初始质量浓度、pH值、CO32-和叔丁醇等因素对SMX去除效果的影响.结果表明,UV/TiO2工艺可以有效地去除水中的SMX,其反应过程符合拟一级反应动力学模型.当TiO2投加量为500mg/L,SMX初始质量浓度为5mg/L,反应液pH值为7时,SMX的去除率达到98.76%,反应速率常数k为0.1438min-1,半衰期t1/2为4.82min.相同条件下,反应速率在TiO2投加量为500mg/L 时最大,pH7时最大,并随SMX初始质量浓度增加而降低.少量CO32-投加不利于SMX的去除,但大量CO32-投加明显促进反应速率.叔丁醇对SMX光催化去除存在显著的抑制效果.同时引入和计算了每一对数减小级电能输入(EEo)指标以评价该工艺的电能利用效率.     

岸滤系统中磺胺甲恶唑、咖啡因和卡马西平的厌氧转化模拟研究

为了探究药品和个人护理用品(PPCPs)在岸滤系统中的转化过程及其影响因素,采集了不同类型的河床岸滤土壤,模拟岸滤系统中的反硝化和硫还原过程,探究该过程中磺胺甲恶唑(Sulfamethoxazole,SMX)及两种共存PPCPs(咖啡因、卡马西平)的转化过程及中间产物的生成.批次培养实验结果显示,至培养周期第87 d时SMX的生物降解率达到100%,反硝化过程中SMX自第5 d开始转化为两种衍生物—D-SMX及4-nitro-SMX,反硝化反应结束两种衍生物再次还原为SMX.SMX的转化率因有机质的不同而产生差异,添加乙酸钠有机质时SMX的转化率整体高于添加富里酸有机质的转化率;硫还原条件下SMX则完全降解;咖啡因(Caffeine,CFE)的生物降解率高于50%,不同河床土壤的理化性质差异及微生物的分布差异造成CFE的吸附及降解效果有很大差异,投加潮白河沉积物样品中CFE生物降解率高于投加密云水库沉积物样品;卡马西平(Carbamazepine,CMZ)的降解率范围在20%~35%,CMZ在岸滤系统中不易发生降解.     

SMX degradation by ozonation and UV radiation: a kinetic study

The rate constants of sulfamethoxazole (SMX) degradation by ozonation and UV₂₅₄ radiation were investigated under various parameters including influent ozone gas concentration, initial SMX concentration, UV light intensity, ionic strength, water quality in terms of varying anions (bicarbonate, sulfate and nitrate), humic acid (HA) and pH. The results indicated that the removal of SMX by ozonation and UV₂₅₄ radiation fitted well to a pseudo first-order kinetic model and the rate constants were in the range of (0.9-9.8) × 10⁻³ and (1.7-18.9) × 10⁻³ s⁻¹, respectively. The second-order rate constants of SMX with ozone (k_O3), under varying operational parameters, were also determined and varied in the range of (0.60-3.38) ± 0.13 × 10⁵ M⁻¹ s⁻¹. In addition, SMX degradation through UV pretreatment followed by ozonation in the presence of HA was proved to be an effective method which can remove SMX with a low ozone dose. The results suggested that ozonation of SMX was more affected by concentration of influent ozone gas, alkalinity, and HA, while incident UV light intensity, pH, and HA were the dominant factors influencing UV degradation of SMX.