UV-C light-enhanced photo-Fenton oxidation of methyl parathion |
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| Authors: | Mababa Diagne Nihal Oturan Mehmet A Oturan Ignasi Sirés |
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| Institution: | 1. Laboratoire Géomatériaux et Géologie de l’Ingénieur, Université Paris-Est, 5 Bd Descartes, 77454, Marne-la-Vallée, Cedex 2, France
2. Faculté des Sciences et Techniques, Institut des Sciences de la Terre, Université Cheikh Anta DIOP, BP 5396, Dakar-Fann, Dakar, Senegal
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| Abstract: | The photodegradation of aqueous solutions containing 0.2 mM methyl parathion has been studied through the optimization of
the H2O2]/Fe3+] ratio in a Fe3+/H2O2/UV-C flow system of 1.3 L capacity. The decay kinetics and TOC abatement have been analyzed for the experiments performed
at pH 3.0 and room temperature. All experiments lead to the total methyl parathion destruction after a few minutes, following
a pseudo-first-order decay kinetics. Total mineralization can be reached after 120 min at the optimum ratio found, due to
the synergistic effect of the very oxidizing hydroxyl radical (·OH) produced via the Fenton reagent and the effective photodecarboxylation at 253.7 nm. |
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