Nano-textured polysilicon solar absorption films |
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Authors: | Hsiao-Ku Shih |
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Institution: | Graduate Institute of Optoelectronic Engineering and Department of Electrical Engineering, National Chung Hsing University, Taichung, Taiwan |
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Abstract: | Nano-textured polysilicon (poly-Si) solar absorption films are to be applied to the solar receiver of solar thermal electricity Stirling engine. These films were fabricated by deposition of hydrogenated amorphous silicon films (a-Si:H) into poly-Si films, using the pulse-wave modulation plasma and furnace annealing of the a-Si:H films. This is followed by wet etching of poly-Si films into nano-textured structures. The films are then coated with a-SiNx:H films as the antireflection and protection layers. It was observed that increasing the pulsed plasma turn-on (ton) time leads to deposition of less dense a-Si:H film with high hydrogen content and void density. This results in films having low dielectric constant and refractive index, and high optical bandgap. Less-dense a-Si:H film can be transferred into large grain size poly-Si film, using annealing. Also, highly rough nano-textured surface structure can be produced, by etching. The denser a-Si:H film, large grain size poly-Si film, and nano-textured surface poly-Si film can enhance the absorbance of sunlight and reduce the emissivity of far infrared light. The nano-textured poly-Si film coated with an a-SiNx:H layer can effectively increase the absorbance of sunlight to approximately 85% and reduce the emissivity of far infrared light to 49%. The nano-textured poly-Si/a-SiNx:H films can be used as efficient solar absorption films for solar thermal electricity Stirling engine. |
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Keywords: | A-Si:H poly-Si nano-textured pulsed plasma solar absorption films |
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