| 微电解处理半导体含铜废水研究 |
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| 引用本文： | 王春冬,张云秀,徐鸣,厉晓华.微电解处理半导体含铜废水研究[J].环境科学与管理,2014(3):106-108. |
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| 作者姓名： | 王春冬 张云秀 徐鸣 厉晓华 |
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| 作者单位： | [1]同济大学环境科学与工程学院,上海200092 [2]中芯国际集成电路制造上海有限公司,上海201203 |
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| 摘 要： | 半导体废水中,含铜废液一般采用委托处理的方式,而含铜废水通常采用与酸性废水混合后进入中和系统再排放。在300 mm晶圆制造过程中,由于含铜废水水量波动大,如果未经有效处理就排放,容易造成总排口铜的超标。采用铁炭微电解对半导体含铜废水处理,研究表明:投加铁炭填料100 g/L,pH调至2.2,反应60分钟进水水质指标范围,铜的去除率可以达到97%以上。
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| 关 键 词： | 微电解 半导体 含铜废水 处理方法 |
Study on Treatment of Cupriferous Wastewater by Micro-electrolysis Process in Semiconductor Industry |
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| Wang Chundong,Zhang Yunxiu,Xu Ming,Li Xiaohua.Study on Treatment of Cupriferous Wastewater by Micro-electrolysis Process in Semiconductor Industry[J].Environmental Science and Management,2014(3):106-108. |
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| Authors: | Wang Chundong Zhang Yunxiu Xu Ming Li Xiaohua |
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| Institution: | 1. School of Environmental Science and Engineering, Tongji University, Shanghai 200092, China; 2. Semiconductor Manufacturing International (Shanghai) Corp. , Shanghai 201203, China) |
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| Abstract: | In semiconductor industry, high concentration cupriferous wastewater is treated by commissioned in general; low concentration cupriferous wastewater is treated in neutralization system after mixed with acidity wastewater .It is easy to cause ex-cessive copper discharge without effective treatment due to its large fluctuations in 300 mm wafer production.Treatment of cuprif-erous wastewater was tested by micro-electrolysis process, the results showed that when the dosage of iron carbon-carbon was 10%, the pH value of wastewater was 2.2, and the reaction time was 60 minutes, the removal rates of copper was higher than 97%. |
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| Keywords: | micro-electrolysis semiconductor cupriferous wastewater treatment process |
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