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Comparison of UV/PDS and UV/H2O2 processes for the degradation of atenolol in water
Authors:Xiaowei Liu  Lei Fang  Yongchao Zhou  Tuqiao Zhang and Yu Shao
Institution:Institute of Municipal Engineering, College of Civil Engineering and Architecture, Zhejiang University, Hangzhou 310058, China
Abstract:UV/H2O2 and UV/peroxodisulfate (PDS) processes were adopted to degrade a typical β-blocker atenolol (ATL). The degradation efficiencies under various operational parameters (oxidant dosage, pH, HCO?3, humic acid (HA), NO?3, and Cl?) were compared. Principal factor analysis was also performed with a statistical method for the two processes. It was found that increasing the specific dosage of the two peroxides (peroxide]0/ATL]0) ranging from 1:1 to 8:1 led to a faster degradation rate but also higher peroxide residual. Within the pH range 3–11, the optimum pH was 7 for the UV/PDS process and elevating pH benefitted the UV/H2O2 process. The presence of HCO?3, HA, and Cl? adversely affected ATL oxidation in both processes. The NO?3 concentration 1–3 mmol/L accelerated the destruction of ATL by the UV/PDS process, but further increase of NO?3 concentration retarded the degradation process, contrary to the case in the UV/H2O2 process. The rank orders of effects caused by the six operational parameters were pH ≈ specific dosage > HA]0 > NO?3]0 > HCO?3]0 > Cl?]0 for the UV/H2O2 process and specific dosage > pH > HA]0 > NO?3]0 > HCO?]0 >Cl?]0 for the UV/PDS process. The UV/PDS process was more sensitive to changes in operational parameters than the UV/H2O2 process but more efficient in ATL removal under the same conditions.
Keywords:sulfate radical  hydroxyl radical  atenolol  influencing factors  rank order
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