| 钙盐沉淀法处理集成电路工业含氟废水影响因素研究 |
| |
| 引用本文： | 程刚,黄翔峰,刘佳,陆丽君,刘开.钙盐沉淀法处理集成电路工业含氟废水影响因素研究[J].云南环境科学,2007,26(4):35-38. |
| |
| 作者姓名： | 程刚 黄翔峰 刘佳 陆丽君 刘开 |
| |
| 作者单位： | 同济大学环境科学与工程学院污染控制与资源化研究国家重点实验室 上海200092 |
| |
| 摘 要： | 研究了钙盐的投加量、pH值以及反应后的静置时间等因素在常温下对氢氧化钙和氯化钙两种钙盐用于处理某集成电路工业含氟废水的影响。结果表明,氢氧化钙在处理该废水过程中优于氯化钙;当达到理论投加量的200%时,pH=8.0左右,静置60m in后,处理初始氟浓度为500mg/L的集成电路工业废水,其出水可以达到污水排放一级标准。
|
| 关 键 词： | 钙盐沉淀法 含氟废水 废水处理 影响因素 |
| 文章编号： | 1673-9655(2007)04-0035-04 |
| 修稿时间： | 2007年3月29日 |
Fluoride Removal from Integrated Circuits Wastewater with Calcium Precipitation |
| |
| CHENG Gang,HUANG Xiang-feng,LIU Jia,LU Li-jun,LIU Kai.Fluoride Removal from Integrated Circuits Wastewater with Calcium Precipitation[J].Yunnan Environmental Science,2007,26(4):35-38. |
| |
| Authors: | CHENG Gang HUANG Xiang-feng LIU Jia LU Li-jun LIU Kai |
| |
| Abstract: | Calcium hydroxide and calcium chloride were used in chemical precipitation of fluoride from integrated circuits wastewater.Under ambient temperature,the effect calcium dosage,pH and settling time of fluoride removal were studied.Results showed that calcium hydroxide was more suitable for application dosage and pH of 8.0,the fluoride concentration fell below 10 mg/l after 60 min of stagnant settling.The quality of treated effluent satisfied the first class of integrated wastewater discharge standard(GB8978-1996). |
| |
| Keywords: | calcium precipitation fluoride bearing wastewater wastewater treatment effective factor |
| 本文献已被 CNKI 等数据库收录！ |
|
