Zum indirekten Photoabbau chlororganischer Verbindungen durch OH-Radikale in der Atmosphäre |
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Authors: | Gudrun Fricke Jörg Hellhammer Andreas Klamt Jan Meerkamp van Embden Manfred Rose Birgit Sewekow Rolf Wittlinger |
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Institution: | 1. Henkel KGaA, TIU/Immissionsschutz/Genehmigungen, D-40000, Düsseldorf 2. Hüls AG, FB Umwelt, Paul-Baumann-Stra?e, D-45764, Marl 3. Angewandte Mathematik, Bayer AG, MD Informatik, D-51368, Leverkusen 4. VCI e. V., Karlstra?e 21, D-60329, Frankfurt 5. Hoechst AG, Umwelttechnik und Verbrauchersicherheit, D-65926, Frankfurt 6. Bayer AG, WV Umweltschutz, D-51368, Leverkusen 7. BASF AG, DUU/OU, ?kologic, D-67056, Ludwigshafen
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Abstract: | The substituent chlorine is generally considered to be an agent which reduces the reactivity of organic molecules with regard to the indirect photodegradation by OH radicals. A systematic study of selected, representative classes of compounds, however, reveals that the deactivating influence of chlorine on the OH radical reactivity is actually rather moderate. In individual cases, for instance, chlorine substitution can even lead to an increase in this reactivity. This study is based on both experimental data and on the molecular orbital calculations of OH radical reactivity. |
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