首页 | 本学科首页   官方微博 | 高级检索  
     检索      


Zum indirekten Photoabbau chlororganischer Verbindungen durch OH-Radikale in der Atmosphäre
Authors:Gudrun Fricke  Jörg Hellhammer  Andreas Klamt  Jan Meerkamp van Embden  Manfred Rose  Birgit Sewekow  Rolf Wittlinger
Institution:1. Henkel KGaA, TIU/Immissionsschutz/Genehmigungen, D-40000, Düsseldorf
2. Hüls AG, FB Umwelt, Paul-Baumann-Stra?e, D-45764, Marl
3. Angewandte Mathematik, Bayer AG, MD Informatik, D-51368, Leverkusen
4. VCI e. V., Karlstra?e 21, D-60329, Frankfurt
5. Hoechst AG, Umwelttechnik und Verbrauchersicherheit, D-65926, Frankfurt
6. Bayer AG, WV Umweltschutz, D-51368, Leverkusen
7. BASF AG, DUU/OU, ?kologic, D-67056, Ludwigshafen
Abstract:The substituent chlorine is generally considered to be an agent which reduces the reactivity of organic molecules with regard to the indirect photodegradation by OH radicals. A systematic study of selected, representative classes of compounds, however, reveals that the deactivating influence of chlorine on the OH radical reactivity is actually rather moderate. In individual cases, for instance, chlorine substitution can even lead to an increase in this reactivity. This study is based on both experimental data and on the molecular orbital calculations of OH radical reactivity.
Keywords:
本文献已被 SpringerLink 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号