| 新型电解槽处理含氰镀铜废水 |
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| 引用本文： | 李伟森 袁淑琴. 新型电解槽处理含氰镀铜废水[J]. 上海环境科学, 1996, 15(1): 28-29 |
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| 作者姓名： | 李伟森 袁淑琴 |
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| 作者单位： | 天津职业大学，天津职业大学，天津职业大学 天津 300402，天津 300402，天津 300402 |
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| 摘 要： | 阐述了一种自行设计的带提升机构的新电解槽的结构特点和原理，经试验选出其最佳条件为：ｔ＝１４ｍｉｎ，Ｉ＝２．８Ａ，废水中盐投加量３０ｇ／Ｌ，药剂用量５０ｍｇ／Ｌ。废水从原来含氰化物２８．７５ｍｇ／Ｌ，含铜量３４．８３ｍｇ／Ｌ，降为含氰０．４５ｍｇ／Ｌ，含铜０．２５ｍｇ／Ｌ，去除率和回收率分别为９８．４３％和８８．５８％。
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| 关 键 词： | 电解槽 氰化物 镀铜 废水处理 电镀废水 |
Treatment of Cyanide-containing Copper Plating Wastewater with New Electrolytic Bath |
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| Li Weishang Yuan Shuqin Bao Ying. Treatment of Cyanide-containing Copper Plating Wastewater with New Electrolytic Bath[J]. Shanghai Environmental Science, 1996, 15(1): 28-29 |
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| Authors: | Li Weishang Yuan Shuqin Bao Ying |
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| Affiliation: | Li Weishang Yuan Shuqin Bao Ying |
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| Abstract: | The structural characteristics and principles of a self-designed new electrolytic bath were described. Its optimal operation parameters were: t = 14min ,I = 2.8A, salt dosed 30g/L, chemical dosed 50mg/L in wastewater. Cyanide and copper contents in wastewater would be decreased from 28.75mg/L and 34.83mg/L to 0.45mg/L and 0.25mg/L, the removal and recovery rates were 98.43% and 88.58% respectively. |
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| Keywords: | Electrolytic bath Electrolytic treatment Cyanide pollution Copper plating |
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