首页 | 本学科首页   官方微博 | 高级检索  
     


Comparisons of the film peeling from the composite oxides of quartz sand filters using ozone, hydrogen peroxide and chlorine dioxide
Authors:Yingming Guo  Tinglin HuangGang Wen  Xin Cao
Affiliation:School of Environmental and Municipal Engineering, Xi''an University of Architecture and Technology, Xi''an 710055, China
Abstract:To solve the problem of shortened backwashing intervals in groundwater plants, several disinfectants including ozone (O3), hydrogen peroxide (H2O2) and chlorine dioxide (ClO2) were examined to peel off the film from the quartz sand surface in four pilot-scale columns. An optimized oxidant dosage and oxidation time were determined by batch tests. Subsequently, the optimized conditions were tested in the four pilot-scale columns. The results demonstrated that the backwashing intervals increased from 35.17 to 54.33 (H2O2) and to 53.67 hr (ClO2) after the oxidation treatments, and the increase of backwashing interval after treatment by O3 was much less than for the other two treatments. Interestingly, the treatment efficiency of filters was not affected by O3 or H2O2 oxidation; but after oxidation by ClO2, the treatment efficiency was deteriorated, especially the ammonia removal (from 96.96% to 24.95%). The filter sands before and after the oxidation were characterized by scanning electron microscopy and X-ray photoelectron spectroscopy. Compared with the oxidation by O3 and H2O2, the structures on the surface of filter sands were seriously damaged after oxidation by ClO2. The chemical states of manganese on the surfaces of those treated sands were only changed by ClO2. The damage of the structures and the change of the chemical states of manganese might have a negative effect on the ammonia removal. In summary, H2O2 is a suitable agent for film peeling.
Keywords:Pilot-scale   Ozone   Hydrogen peroxide   Chlorine dioxide   Backwashing interval
本文献已被 万方数据 等数据库收录!
点击此处可从《环境科学学报(英文版)》浏览原始摘要信息
点击此处可从《环境科学学报(英文版)》下载全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号