| 应用消毒剂建立宿轮虫的无菌培养系 |
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| 引用本文： | 沈成媛,丁国际,穆丽,杨芳芳,焦正,吴明红.应用消毒剂建立宿轮虫的无菌培养系[J].环境科学学报,2010,30(1):72-78. |
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| 作者姓名： | 沈成媛 丁国际 穆丽 杨芳芳 焦正 吴明红 |
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| 作者单位： | 上海大学环境与化学工程学院,上海,200444 |
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| 基金项目： | 北京市教育委员会共建项目专项资助~~ |
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| 摘 要： | 以污水生物处理中一种常见的有益微型动物——宿轮虫为对象,进行了应用消毒剂建立宿轮虫的无菌培养系的方法学研究.在对消毒剂次氯酸钠、甲醛及PreventolD7分别作用下的轮虫培养液中宿轮虫卵的孵化率和细菌密度变化趋势分析的基础上,建立了以确保较高的卵孵化率为前提、通过多次的抑菌培养轮虫、使培养液中细菌数量逐渐减少直至消亡、最终获得无菌轮虫的方法,即逐渐减菌方法.该方法与传统的一次性灭菌方法相比,克服了传统方法在轮虫存活率很低的条件下进行无菌化的缺点,因此,可降低对消毒条件的严格要求并提高了成功率.运用逐渐灭菌方法,为确保约50%的卵孵化率,分别使用40μL·L-1甲醛和4μL·L-1 PreventolD7进行48h抑菌培养,经过4次对宿轮虫的抑菌培养,均获得了无菌的宿轮虫种群.实验结果表明,无菌化宿轮虫种群的繁殖速度与未经无菌化的宿轮虫种群相当.
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| 关 键 词： | 背景气体 介质阻挡放电 NO去除率 |
| 收稿时间： | 4/3/2009 11:09:20 PM |
| 修稿时间： | 6/19/2009 5:50:46 PM |
A bacteria-free culture system of Habrotrocha. Sp.(Rotifera:Bdelloidea) built with disinfectants |
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| SHEN Chengyuan,DING Guoji,MU Li,YANG Fangfang,JIAO Zheng and WU Minghong.A bacteria-free culture system of Habrotrocha. Sp.(Rotifera:Bdelloidea) built with disinfectants[J].Acta Scientiae Circumstantiae,2010,30(1):72-78. |
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| Authors: | SHEN Chengyuan DING Guoji MU Li YANG Fangfang JIAO Zheng and WU Minghong |
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| Institution: | College of Environmental and Chemical Engineering, Shanghai University, Shanghai 200444,College of Environmental and Chemical Engineering, Shanghai University, Shanghai 200444,College of Environmental and Chemical Engineering, Shanghai University, Shanghai 200444,College of Environmental and Chemical Engineering, Shanghai University, Shanghai 200444,College of Environmental and Chemical Engineering, Shanghai University, Shanghai 200444 and College of Environmental and Chemical Engineering, Shanghai University, Shanghai 200444 |
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| Abstract: | A testing rig composed of high voltage power and coaxial cylinder-tube dielectric barrier discharge reaction vessel was designed to study NO removal with a non-thermal plasma using different background gases. The influences of applied voltage,ratio of O2,residence time and discharge power on NO removal rate were also investigated. According to the experimental results,the NO removal rate increases remarkably with discharge voltage within a certain range (Ar:5~7 kV;N2:9~11 kV) in the different background gas... |
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| Keywords: | background gases dielectric barrier discharge NO removal rate |
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