UV、O3及UV/O3削减耐药菌和抗性基因性能

从某污水处理厂二级出水分离出粪肠球菌、短芽孢杆菌、假单胞杆菌和大肠杆菌4种耐药菌，通过菌落计数法、qPCR评价UV、O₃及UV/O₃对耐药菌和抗性基因的削减效果.研究表明，3种方式对耐药菌均有较好的削减效果，其中革兰氏阳性菌灭活效果比阴性菌差；对抗性基因的削减受消毒方式和抗性基因的种类影响较大，结果表明短芽孢杆菌在耐药菌和抗性基因削减过程中表现出较强的抗逆性.结合复活实验和扫描电镜发现，UV消毒72h后耐药菌的光复活率为6.93%~11.58%；O₃因破坏了细胞结构未出现光复活现象，这一过程中胞内抗性基因可能释放到环境中；UV/O₃对耐药菌造成的损伤同样具有不可逆性.

Reduction of ARB and ARGs by ultraviolet,ozone and combined disinfection technology

Four kinds of resistant bacterium Enterococcus, Brevibacillus, Pseudomonas, and Escherichia coli were isolated from the secondary effluent of a sewage treatment plant. The reduction effect of three disinfection methods of UV, O₃ and UV/O₃ on ARB and ARGs was evaluated by colony counting method and qPCR. The study showed that the three methods had obvious inactivation of ARB, and the effect on inactivation of Gram-positive bacteria was worse than that of Gram-negative bacteria. The reduction of ARGs varied by the means of disinfection and the types of ARGs, and the result indicated that Brevibacillus showed stronger resistance during the reduction process of ARB and ARGs. In addition, combined with photoreactivation experiments and scanning electron microscopy, it was found that the photoreactivation rate of ARB after UV disinfection for 72h was between 6.93% and 11.60%. There was no photoreactivation phenomenon by O₃ due to the destruction of cell structure, which might lead intracellular ARGs to be released into the environment. Meanwhile, the ARB damage caused by UV/O₃ was also irreversible.