Factors affecting degradation of dimethyl sulfoxide (DMSO) by fluidized-bed Fenton process |
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Authors: | Luzvisminda M. Bellotindos Meng-Hsuan Lu Thanakorn Methatham Ming-Chun Lu |
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Affiliation: | 1. Archie Eustaquio Research Laboratory, Universidad de Zamboanga, Zamboanga City, Philippines 2. Department of Environmental Resources Management, Chia Nan University of Pharmacy and Science, Tainan, 717, Taiwan 3. Investment and Planning Division, Department of Policy and Strategy, Deputy Governor (Plan and Development), Metropolitan Waterworks Authority (MWA), 400 Prachacheun Road, Tungsonghong, Laksi, Bangkok, 10210, Thailand
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Abstract: | In this study, the target compound is dimethyl sulfoxide (DMSO), which is used as a photoresist stripping solvent in the semiconductor and thin-film transistor liquid crystal display (TFT-LCD) manufacturing processes. The effects of the operating parameters (pH, Fe2+ and H2O2 concentrations) on the degradation of DMSO in the fluidized-bed Fenton process were examined. This study used the Box-Behnken design (BBD) to investigate the optimum conditions of DMSO degradation. The highest DMSO removal was 98 % for pH 3, when the H2O2 to Fe2+ molar ratio was 12. At pH 2 and 4, the highest DMSO removal was 82 %, when the H2O2 to Fe2+ molar ratio was 6.5. The correlation of DMSO removal showed that the effect of the parameters on DMSO removal followed the order Fe2+?>?H2O2?>?pH. From the BBD prediction, the optimum conditions were pH 3, 5 mM of Fe2+, and 60 mM of H2O2. The difference between the experimental value (98 %) and the predicted value (96 %) was not significant. The removal efficiencies of DMSO, chemical oxygen demand (COD), total organic carbon (TOC), and iron in the fluidized-bed Fenton process were higher than those in the traditional Fenton process. |
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