Photochemical degradation of ciprofloxacin in UV and UV/H2O2 process: kinetics, parameters, and products |
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| Authors: | Hong-Guang Guo Nai-Yun Gao Wen-Hai Chu Lei Li Yong-Ji Zhang Jin-Shan Gu Yu-Liang Gu |
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| Affiliation: | 1. State Key Laboratory of Pollution Control and Resources Reuse, College of Environmental Science and Engineering, Tongji University, Shanghai, 200092, China
2. National Engineering Research Center for Urban Water Resource, Shanghai, 200082, China
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| Abstract: | Photochemical degradation of fluoroquinolone ciprofloxacin (CIP) in water by UV and UV/H2O2 were investigated. The degradation rate of CIP was affected by pH, H2O2 dosage, as well as the presence of other inorganic components. The optimized pH value and H2O2 concentration were 7.0 and 5 mM. Carbonate and nitrate both impeded CIP degradation. According to liquid chromatography–tandem mass spectrometry analysis, four and 16 products were identified in UV and UV/H2O2 system, respectively. Proposed degradation pathways suggest that reactions including the piperazinyl substituent, quinolone moiety, and cyclopropyl group lead to the photochemical degradation of CIP. Toxicity of products assessed by Vibrio qinghaiensis demonstrated that UV/H2O2 process was more capable on controlling the toxicity of intermediates in CIP degradation than UV process. |
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