| 电子工业光致抗蚀剂乳化废水预处理试验研究 |
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| 引用本文： | 马前,李义久,陈伟,倪亚明.电子工业光致抗蚀剂乳化废水预处理试验研究[J].环境污染与防治,2002,24(4):207-209,215. |
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| 作者姓名： | 马前 李义久 陈伟 倪亚明 |
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| 作者单位： | 1. 同济大学测试中心污染控制与资源化研究国家重点实验室,上海,200092
2. 上海市苏州河综合整治建设有限公司,上海,200025 |
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| 摘 要： | 研究了光致抗蚀剂乳化废水用硫酸和含钙辅助破乳分离出有机物沉淀的预处理工艺。确定了最合适的预处理工艺参数和流程；用GC／MS法分析了废水的组成和浓度，并探讨了有机物的去除机理。试验结果表明，pH值控制在3，辅助剂A的浓度为300mg/L、静置时间为60min时，是最合适的工艺条件，废水的CODcr值从15600mg/L下降到3542mg/L，CODcr的去除率达77.4%，投加辅助剂后既提高了有机物的去除率，又改善了沉淀物的过滤性能，从而有利于降低后续工艺的处理成本。
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| 关 键 词： | 电子工业 光致抗蚀剂 乳化废水 预处理 试验研究 CODcr 破乳 废水处理 |
Experimental pretreatment of photoresist emulsified wastewater in the electronic industry |
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| Ma Qian,Li Yijiu,et al..Experimental pretreatment of photoresist emulsified wastewater in the electronic industry[J].Environmental Pollution & Control,2002,24(4):207-209,215. |
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| Authors: | Ma Qian Li Yijiu |
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| Institution: | Ma Qian,Li Yijiu,et al. Analysis and Research Center?State Key Laboratory of Pollution Control and Resource Reuse,Tongji University,Shanghai 200092\, |
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| Abstract: | The pretreatment technology and organic removal mechanisms of the photoresist emulsified wastewater in the electronic industry were discussed. The organic compounds were separated with the sulfuric acid and additive. It brings something forward the adaptable treating condition and technological process. The composition of the organic compound was detected by GC/MS analysis in the source and after the pretreatment wastewater. The experimental results showed the removal rate of COD\-\{Cr\} reached 77.4% and the COD\-\{Cr\} of the wastewater took from 15 600 to 3 540 mg/L when pH was 3, the concentration of additive was 300 mg/L and stewing time was 60 min; The additive added not only improve the performance the organic deposition but also reduce the cost of the follow\|up treating technology. |
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| Keywords: | COD\-\{Cr\} removal\ Deemulsification\ Photoresists\ Emulsified wastewater |
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