An approach for domino effect reduction based on optimal layouts |
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| Authors: | Antioco López-Molina Richart Vázquez-Román M Sam Mannan M Guadalupe Félix-Flores |
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| Institution: | 1. Instituto Tecnológico de Celaya, Departamento de Ingeniería Química, Av. Tecnológico y A.G. Cubas s/n, Celaya 38010, Gto., Mexico;2. Mary Kay O’Connor Process Safety Center, Artie McFerrin Department of Chemical Engineering, Texas A&M University, College Station, TX 77843-3122, USA;3. Unidad Académicade Ciencias Químicas, Universidad Autónoma de Zacatecas, CU-Siglo XXI, Edificio 6, km 6 Carr. Zacatecas-Guadalajara s/n, Ejido La Escondida, Zacatecas 98160, Zac., Mexico |
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| Abstract: | An approach to reduce the probability of producing a domino effect in process industry is developed in this work. It is assumed that optimal layouts should include appropriate analysis to reduce risk during the process design stage. The model developed for this approach combines the estimation of probability of damage due to overpressure, proposed by Mingguang and Juncheng (2008), and escalation threshold values defined by Cozzani, Gubinelli, and Salzano (2006). These equations are combined with other typical layout constraints as well as bounding the probability constraint, which has resulted in a highly non-linear MINLP problem. Solving a case study used by other authors provides evidence for reliability of the developed approach. In this way, layouts are designed to reduce the escalation probability yielding safe distributions. |
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