微气泡曝气 O3/ H2O2处理 RO 浓水的效能及影响因素简

采用O₃/H₂O₂高级氧化工艺处理炼油厂反渗透（RO）浓水，用溶气泵加压溶气并产生微气泡强化传质，确定装置运行条件，考察气体中臭氧浓度、H₂O₂/O₃初始摩尔比、pH和温度对O₃/H₂O₂处理RO浓水效果的影响，并对RO浓水处理效能进行研究。结果表明，随着气体中臭氧浓度的增加，COD的去除率基本呈线性增加；加入适当量H₂O₂能提高臭氧氧化RO浓水的效果，H₂O₂/O₃初始摩尔比在0~0.8范围内，COD的去除率先增加后下降，H₂O₂/O₃初始摩尔比为0.5时COD去除率最大；pH从6.84增加到9.01，COD去除率逐渐增大，pH为10.03时COD去除率反而降低；在14~28℃范围内，温度低时，升高温度COD去除率增加较大，温度较高时，升高温度对COD去除率的影响较小。为考察该工艺的稳定性，在H₂O₂/O₃初始摩尔比为0.5、溶液pH为8~9、臭氧浓度为80~100 mg/L、温度为10~28℃条件下，对COD为90~140 mg/L的RO浓水氧化处理4~10 h，出水COD维持在39.9~49.9 mg/L，达到《城镇污水处理厂污染物排放标准（GB 18918-2002）》中的一级A标准；去除1 g COD消耗O₃ 1.4~3.3 g，消耗O₃与H₂O₂的总氧量为2.2~4.4 g。     

催化臭氧化降解技术中的两个问题

探讨了有机物特性及中间产物H₂O₂在催化臭氧化中的作用。结果表明，有机物在自由基链反应过程中的特性直接影响催化臭氧化的降解效率。当目标有机物是对链反应具有促进作用的甲酸时，自由基引发反应可以明显提高甲酸的臭氧化效率。当目标有机物是对自由基链反应具有抑制剂作用的乙酸时，O₃和Fe²⁺/O₃对乙酸有着相似的降解效率。以上结果表明，自由基引发反应并不是臭氧化降解效率提高的充分条件。另外，当臭氧化过程有H₂O₂产生时，必须考虑类Fenton反应对臭氧化效率的影响。     

O3/H2O2降解阿特拉津影响因素研究

采用O3/H2O2氧化去除水中内分泌干扰物阿特拉津，考察了反应条件及水质对去除的影响，并对反应机制进行了初步探讨。阿特拉津初始浓度2 mg/L，投量为7.5 mg/L的O₃单独氧化去除率为27.2%；相同O₃投量下，控制H₂O₂/O₃摩尔比为0.75，5 min阿特拉津的去除率最高可达96.5%；pH 值为7.5～8.5，温度在25～40℃的范围内，都维持了较高的去除率，表明H₂O₂/O₃体系对阿特拉津的去除效果良好，降解速度快，反应条件温和。0.5 mg/L的腐殖酸，对阿特拉津的去除影响不大，腐殖酸浓度为1、2和5 mg/L时，平均去除率分别为63.4%、50.7%和30.2%；碳酸氢钠的浓度为50和200 mg/L时，去除率分别为88.1%和73.8%，说明水质对阿特拉津的去除影响较大。叔丁醇的浓度为5和20 mg/L时，阿特拉津的去除率分别降低到44.7%和27.5%，去除率随自由基抑制剂叔丁醇增加而降低，说明H₂O₂/O₃降解阿特拉津主要为该体系产生的羟基自由基的贡献。     

真空紫外光臭氧降解偏二甲肼的研究

研究比较了臭氧氧化（O₃）、紫外臭氧（O₃/UV）和真空紫外臭氧（O₃/VUV）对推进剂——偏二甲肼的处理效果，O₃/VUV最为有效，反应速率常数分别比O₃/UV和O₃高39.8%和65.6%，中间产物——甲醛去除得更迅速，反应50 min即无法检出。初始pH 9时，O₃/VUV降解偏二甲肼的速率最快，达到0.4461 min^-1；反应速率常数随臭氧投加量的增加而线性增大；随偏二甲肼初始浓度从100 mg/L增加到2 000 mg/L，反应动力学由一级转为零级。碳酸盐浓度在0～2 mmol/L范围内对O₃/VUV降解偏二甲肼没有明显的抑制作用。偏二甲肼的无机氮产物以氨离子为主，无机氮只占总氮的40%～60%，说明仍有相当比例的氮以有机氮形式存在。     

O3、H2O2/O3及UV/O3在焦化废水深度处理中的应用

采用O₃、H₂O₂/O₃和UV/O₃等高级氧化技术(AOPs)对某焦化公司的生化出水进行深度处理，考察了O₃与废水的接触时间、溶液pH、反应温度等因素对废水COD去除率的影响，确定出O₃氧化反应的最佳工艺参数为：接触时间40 min，溶液pH 8.5，反应温度25℃，此条件下废水COD及UV₂₅₄的去除率最高可达47.14%和73.47%；H₂O₂/O₃及UV/O₃两种组合工艺对焦化废水COD及UV₂₅₄的去除率均有一定程度的提高，但H₂O₂/O₃系统的运行效果取决于H₂O₂的投加量。研究结论表明，单纯采用COD作为评价指标，并不能准确反映出O₃系列AOPs对焦化废水中有机污染物的降解作用。     

O3/UV预处理磺酰脲类除草剂生产废水的研究

采用O₃/UV工艺预处理磺酰脲类除草剂生产废水，考察了初始pH值、臭氧投量、叔丁醇投加等因素对废水处理效果的影响，并初步探讨了该工艺处理废水的反应机理。实验结果表明，在废水初始pH为13.59和臭氧投量为65.08 mg/min的条件下，预处理80 min后废水COD去除率达63.47%，BOD₅/COD由0.03提高至0.56，EC50从11%提高至55%。随着叔丁醇浓度的增加，废水COD去除率明显降低，证明该反应体系有?OH存在；体系中加入MnO₂后废水COD去除率下降了16%，氧化效率明显下降，证明该反应体系内中间产物H₂O₂在O₃/UV降解有机废水过程中起到了重要的作用。     

Fenton氧化/高浓度泥浆法处理矿山废水

为了解决某大型铜矿废水COD不达标问题，采用Fenton氧化对原有高浓度泥浆（HDS）工艺进行改进。探讨了Fenton氧化矿山废水各指标的去除效果以及H₂O₂浓度对出水COD去除效果的影响，结果表明，Fenton氧化-电石乳中和絮凝沉淀工艺处理矿山废水是可行的，最优实验条件为：pH稳定在3.0～4.5，H₂O₂投加量0.5 mL/L，电石乳投加量8.5 g/L，PAM投加量1.5 mg/L；系统对废水COD的去除机理是加入的H₂O₂和矿山酸性废水中的Fe²⁺离子在低pH下形成Fenton试剂；系统对TFe、Zn²⁺、Cu2+ 的去除效果比Mn²⁺的去除效果更稳定。     

碳纳米管对偏二甲肼的吸附性能分析

利用NaOH和H₂O₂对碳纳米管进行表面处理，用于去除低浓度偏二甲肼废液，用分光光度法进行测定。扫描电镜和红外谱图观测表明，原产品管子较长，分散性差，NaOH处理的分散性好，H₂O₂处理的管子被截断并且表面引入了—OH、 >CO和—COOH。碳纳米管对偏二甲肼的吸附性能研究表明，H₂O₂浸泡氧化方法改性的碳纳米管吸附去除偏二甲肼效能最佳，NaOH处理的次之，原产品稍差。通过对吸附数据的拟合,发现在温度为298 K和40～190 mg/L的浓度范围内，吸附等温线均符合Freundlich和Langmuir吸附等温式。     

模拟医疗废物在管式电阻炉上的热解特性研究

在管式电阻炉上对由聚丙烯、面巾纸、纱布、医用脱脂棉、一次性口罩、医用乳胶手套等按一定比例组成的模拟医疗废物在氮气气氛进行了热解研究。重点探讨了10 K/min，20 K/min，30 K/min和40 K/min等不同升温速率对热解产物分布、产气特性和热解过程的影响。结果表明，随着温度升高，模拟废物的热解产生气体的主要成分逐渐由CO₂和CO转变为C₃H₆、CH₄、C₂H₆、C₂H₄和C₃H₈。同时，热解处理对模拟废物的减量化效果比较明显，固体残留率仅为5.61%～7.02%。而且，加热速率对模拟医疗废物热解过程的影响较大。     

UV-Fenton光催化氧化处理高浓度邻苯二甲酸二辛酯生产废水

采用UV-Fenton技术光催化氧化高浓度邻苯二甲酸二辛酯（DOP）生产废水，确定最佳操作条件为：初始pH=3.8，H₂O₂浓度为9.99 g/L，H₂O₂/Fe²⁺摩尔比为20∶1，光照反应60 min。此条件下的废水COD去除率为89.1%，出水COD值在570 mg/L左右。经正交试验确定影响处理效果各因素的重要性顺序为：H₂O₂浓度＞H₂O₂/Fe²⁺摩尔比＞光照反应时间＞pH。UV的加入与单独的Fenton体系存在正相关的协同作用。废水降解的表观过程符合一级反应动力学模式。     

Fenton-like degradation of nalidixic acid with Fe3+/H2O2

The Fenton-like degradation of nalidixic acid was studied in this work. The effects of Fe³⁺ concentration and initial H₂O₂ concentration were investigated. Increasing the initial H₂O₂ concentration enhances the degradation and mineralization efficiency for nalidixic acid, while Fe³⁺ shows an optimal concentration of 0.25 mM. A complete removal of nalidixic acid and a TOC removal of 28 % were achieved in 60 min under a reaction condition of [Fe³⁺]?=?0.25 mM, [H₂O₂]?=?10 mM, T?=?35 °C, and pH?=?3. LC–MS analysis technique was used to analyze the possible degradation intermediates. The degradation pathways of nalidixic acid were proposed according to the identified intermediates and the electron density distribution of nalidixic acid. The Fenton-like degradation reaction of nalidixic acid mainly begins with the electrophilic attack of hydroxyl radical towards the C₃ position which results in the ring-opening reaction; meanwhile, hydroxyl radical attacking to the branched alkyl groups of nalidixic acid leads to the oxidation at the branched alkyl groups.     

Method of removal of volatile organic compounds by using wet scrubber coupled with photo-Fenton reaction - Preventing emission of by-products

The photo-Fenton reaction was applied as a novel method for the removal of volatile organic compounds (VOCs) in the gas phase, and its effectiveness was experimentally examined. In conventional VOCs removal methods using a photocatalyst or ozone, VOCs are oxidized in the gas phase. Therefore, incompletely oxidized intermediates, which may have adverse effects on health, are likely to contaminate the treated air. On the other hand, in the VOCs removal method developed in this study, because the VOCs are oxidized in the liquid phase by the photo-Fenton reaction, any incompletely oxidized intermediates produced are confined to the liquid phase. As a result, the contamination of the treated air by these harmful intermediates can be prevented. Using a semi-batch process, it was found that the removal efficiency for toluene in a one-pass test (residence time of 17 s) was 61%, for an inlet toluene gas concentration of 930 ppbv, an initial iron ion concentration of 20 mg L⁻¹, and an initial hydrogen peroxide concentration of 630 mg L⁻¹. The removal efficiency was almost constant as long as H₂O₂ was present in the solution. Proton transfer reaction mass spectrometry analysis confirmed the absence of any incompletely oxidized intermediates in the treated air.     

O3/H2O2处理嘧啶废水的研究

采用O3/H2O2法对嘧啶废水进行处理,考察了不同反应条件对嘧啶和COD去除率的影响,并对O3/H2O2降解嘧啶的反应机制和动力学进行了初步探讨.实验结果表明,在pH值为11,反应时间为70 min,O3流量为4g/h,H2O2投加量为50 mmol/L的条件下,废水的嘧啶和COD的去除率分别达到86.46%和74.9...     

Decomposition of phenylarsonic acid by AOP processes: degradation rate constants and by-products

The paper presents results of the studies photodegradation, photooxidation, and oxidation of phenylarsonic acid (PAA) in aquatic solution. The water solutions, which consist of 2.7 g dm^?3 phenylarsonic acid, were subjected to advance oxidation process (AOP) in UV, UV/H₂O₂, UV/O₃, H₂O₂, and O₃ systems under two pH conditions. Kinetic rate constants and half-life of phenylarsonic acid decomposition reaction are presented. The results from the study indicate that at pH 2 and 7, PAA degradation processes takes place in accordance with the pseudo first order kinetic reaction. The highest rate constants (10.45?×?10^?3 and 20.12?×?10^?3) and degradation efficiencies at pH 2 and 7 were obtained at UV/O₃ processes. In solution, after processes, benzene, phenol, acetophenone, o-hydroxybiphenyl, p-hydroxybiphenyl, benzoic acid, benzaldehyde, and biphenyl were identified.     

A novel application of H2O2-Fe(II) process for arsenate removal from synthetic acid mine drainage (AMD) water

Batch experiments were carried out to investigate the influences of H₂O₂/Fe(II) molar ratio, pH, sequence of pH adjustment, initial As(V) concentration, and interfering ions on As(V) removal in H₂O₂-Fe(II) process from synthetic acid mine drainage (AMD). The optimum H₂O₂/Fe(II) molar ratio was one for arsenate removal over the pH range of 4-7. Arsenate removal at pH 3 was poor even at high Fe(II) dosage due to the high solubility of Fe(III) formed in situ. With the increase of Fe(II) dosage, arsenate removal increased progressively before a plateau was reached at pH 5 as arsenate concentration varied from 0.05 to 2.0 mg L⁻¹. However, arsenate removal was negligible at Fe/As molar ratio <3 and then experienced a striking increase before a plateau was reached at pH 7 and arsenate concentration ≥1.0 mg L⁻¹. The co-occurring ions exerted no significant effect on arsenate removal at pH 5. The experimental results with synthetic AMD revealed that this method is highly selective for arsenate removal and the co-occurring ions either improved arsenate removal or slightly depressed arsenate removal at pH 5-7. The extended X-ray absorption fine structure (EXAFS) derived As-Fe length, 3.27-3.30 Å, indicated that arsenate was removed by forming bidentate-binuclear complexes with FeO(OH) octahydra. The economic analysis revealed that the cost of the H₂O₂-Fe(II) process was only 17-32% of that of conventional Fe(III) coagulation process to achieve arsenate concentration below 10 μg L⁻¹ in treated solution. The results suggested that the H₂O₂-Fe(II) process is an efficient, economical, selective and practical method for arsenate removal from AMD.     

Reactions between ozone and building products: Impact on primary and secondary emissions

Reactions of ozone on common building products were studied in a dedicated emission test chamber system. Fourteen new and unused products were exposed to 100–160 ppb of ozone at 23 °C and 50% RH during 48 h experiments. Ozone deposition velocities calculated at steady state were between 0.003 cm s⁻¹ (alkyd paint on polyester film) and 0.108 cm s⁻¹ (pine wood board). All tested product showed modified emissions when exposed to ozone and secondary emissions of several aldehydes were identified. Carpets and wall coverings emitted mainly C₅–C₁₀ n-aldehydes, typical by-products of surface reactions. Linoleum, polystyrene tiles and pine wood boards also showed increased emissions of formaldehyde, benzaldehyde and hexanal associated with reduced emissions of unsaturated compounds suggesting the occurrence of gas-phase reactions. The ozone removal on the different tested products was primarily associated with surface reactions. The relative contribution of gas-phase reactions to the total ozone removal was estimated to be between 5% and 30% for pine wood boards depending on relative humidity (RH) and on the incoming ozone concentration and 2% for polystyrene tiles. On pine wood board, decreasing ozone deposition velocities were measured with increasing ozone concentrations and with RH increasing in the range 30–50%.     

Enhanced removal of humic acid from micro-polluted source water in a surface discharge plasma system coupled with activated carbon

Surface discharge plasma (SDP) combined with activated carbon (AC) was employed to eliminate dissolved organic matter from micro-polluted source water, with humic acid (HA) as the model pollutant. Synergistic effect on HA removal was observed in the SDP-AC system; HA removal efficiency reached 60.9% within 5-min treatment in the SDP-AC system with 5.0 g AC addition, whereas 16.7 and 17.4% of HA were removed in sole SDP system and AC adsorption, respectively. Scanning electron microscope and Boehm titration analysis showed that chemical reactions between active species and functional groups of AC occurred. The existence of isopropanol or benzoquinone exhibited inhibitive effects on HA removal in the SDP system, while these inhibitive effects were weakened in the SDP-AC system. The influences of AC on ozone equivalent concentration and H₂O₂ concentration were evaluated, and there were approximately 39 and 20% decline in ozone equivalent concentration and H₂O₂ concentration within 6-min treatment in the SDP-AC system, respectively, compared with those in the sole SDP system. Dissolved organic carbon, specific ultraviolet absorbance, and UV absorption ratios analysis demonstrated that the SDP treatment destroyed the chromophoric groups, double bonds, and aromatic structure of HA molecules, and these destructive actions were strengthened by AC.     

Degradation of diuron in aqueous solution by ozonation

Degradation of diuron [3-(3,4-dichlorophenyl)-1,1-dimethylurea] in aqueous solution and the proposed degradation mechanism of diuron by ozonation were investigated. The factors that affect the degradation efficiency of diuron were examined. The generated inorganic ions and organic acids during the ozonation process were detected. Total organic carbon removal rate and the amount of the released Cl^? increased with increasing ozonation time, but only 80.0% of the maximum theoretical concentration of Cl^? at total mineralization was detected when initial diuron concentration was 13.8 mg L^?1. For N species, the final concentrations of NO₃ ^? and NH₄ ⁺ after 60 min of reaction time were 0.28 and 0.19 mg L^?1, respectively. The generated acetic acid, formic acid and oxalic acid were detected during the reaction process. The main degradation pathway of diuron by ozonation involved a series of dechlorination-hydroxylation, dealkylation and oxidative opening of the aromatic ring processes, leading to small organic species and inorganic species. The degradation efficiency of diuron increased with decreasing initial diuron concentration. Higher pH value, more ozone dosage, additive Na₂CO₃, additive NaHCO₃ and additive H₂O₂ were all advantageous to improve the degradation efficiency of diuron.     

低温等离子体氧化氨气影响因素及动力学研究

采用电晕放电低温等离子体处理模拟氨气恶臭气体,考察了输入功率、初始浓度、气体湿度、停留时间等因素对降解效果和能量效率的影响,同时对反应过程进行了动力学研究。研究表明,输入功率以及停留时间对氨气降解的影响是积极的,但能量效率随着两者的增加先增大后减小。氨气的降解率随着初始浓度的增加而降低,而能量效率随着输入功率的增加而增加。氨气降解率和能量效率均随着气体湿度的增加而增加,当气体湿度为45%时达到最大值,然而随着气体湿度的进一步增加,其降解率和能量效率反而降低。反应尾气中臭氧浓度随着输入功率的增加而不断升高,而氨气的存在却使臭氧浓度有不同程度的降低。对电晕放电低温等离子体处理NH3的反应动力学进行了分析,得到NH3的反应速率常数为kNH3=0.0707 m3/(W·h)。     

玻璃减薄蚀刻液中氟硅酸的选择性脱除方法

光电玻璃减薄蚀刻液中氟硅酸(H2SiF6)的累积,是导致蚀刻液无法连续使用而转化为废液的主要原因。尝试对蚀刻废液中氟硅酸进行选择性脱除工艺,探索刻蚀液循环利用的有效处理方法。鉴于氟硅酸的碱金属盐具有溶解度较低的特点,研究考察了利用钠盐或钾盐为沉淀剂,将废液中的H2SiF6以氟硅酸盐的形式沉淀去除,为实现蚀刻液的循环利用提供可能。结果表明,KCl相比NaCl对H2SiF6处理效果更好,但生成的K2SiF6的结晶颗粒过细,难以自然沉降,过滤效果较差;而Na2SiF6结晶沉降特性较好,且使用NaCl为沉淀剂具有价廉易得等特点,可作为氟硅酸的理想沉淀剂。H2SiF6去除率与碱金属盐H2SiF6摩尔计量比正相关,当摩尔计量比NaCl/H2SiF6=2,H2SiF6含量10%的模拟废液,其H2SiF6去除率可达到90%以上。