污水处理厂消毒技术对抗生素抗性菌的强化去除

基于消毒技术对污水处理厂出水中总异养菌(total heterotrophic bacteria,HPC)及5种抗生素抗性菌(antibiotic resistant bacteria,ARB):氨苄霉素抗性菌(AMP)、红霉素抗性菌(ERY)、四环素抗性菌(TET)、卡那霉素抗性菌(KAN)、环丙沙星抗性菌(CIP)的去除情况研究,分析消毒技术对ARB的强化去除效果.结果表明,实际污水处理厂的紫外消毒对ARB去除率仅为18.2%~40.9%,且AMP含量最高;另外,消毒技术对ERY有选择性去除效果,对其他4种ARB无明显选择性去除效果(P0.05);最后结合次氯酸钠、臭氧、紫外消毒处理对COD、NH_4~+-N的去除效果,确定强化去除ARB的消毒方式中臭氧,次氯酸钠和紫外的最佳浓度和剂量依次为5.0 mg·L~(-1)、25.0 mg·L~(-1)和45.0 m J·cm~(-2),ARB去除率依次为45.5%~74.5%、66.1%~85.5%、68.6%~85.5%,另外次氯酸钠耦合紫外消毒强化去除ARB的效果更佳.     

UV和H2 O2联合消毒灭活饮用水中大肠杆菌研究

以大肠杆菌为研究对象,对单独紫外线(UV)、H2O2及两者不同组合方式的灭活效果进行了分析.结果表明,单独H2O2对大肠杆菌基本无灭活效果,加入浓度为20 mg·L-1的H2O2接触时间为30 min时,灭活率仅为0.02个对数级;单独UV工艺可在一定程度上灭活大肠杆菌,紫外线剂量为10 mJ·cm-2时,灭活率可达到4.51个对数级.紫外线和H2O2联合消毒在一定程度上提高了消毒效果,且不同的组合方式对灭活效果有很大的影响.先UV后H2O2消毒效果优于先H2O2后UV,当紫外线剂量为5 mJ·cm-2时,加入H2O2分别反应2.5、5、10、20 min后,两者的灭活率分别较单独UV消毒增加0.09、0.35、0.38、0.68和0.01、0.07、0.14、0.53个对数级.而UV与H2O2同时消毒效果优于UV与H2O2顺序消毒,当紫外线剂量为5 mJ·cm-2时,加入H2O2反应20 min后,灭活率较UV-H2O2和H2O2-UV工艺分别增加了0.43和0.58个对数级.随着紫外线强度的增加,大肠杆菌的灭活效果不断提高.     

超滤处理洗涤污水循环利用的中试研究

采用不同材质国产超滤膜聚丙烯（PP）、聚丙烯腈（PAN）和聚砜（PS）,进行了洗涤污水处理循环利用的现场中试研究.结合超滤工艺出水水质和膜污染分析,3种膜材质中PAN膜较优,有效去除了水中浊度、悬浮物、油脂等污染物,一定程度保留了游离阴离子表面活性剂（LAS）,长期循环洗涤对衣物的白度无不良影响.根据相关性分析,超滤出水较高COD值很大程度上是由水中LAS引起的.超滤膜对细菌、大肠菌群的去除率较低,出水通过紫外消毒,当紫外线密度≥3?750 J/m²时,微生物水平能够达到国家饮用水水质标准.根据不同水力反冲洗条件下膜渗透通量和净产水量比较,PAN膜最佳水力反冲洗条件为0.5 h反冲洗2 min.长期运行时超滤膜化学清洗方法采用碱洗法方便有效.     

CFD技术在水处理紫外消毒中的应用

介绍了紫外消毒在水处理中应用的现状,阐述了计算流体力学(CFD)的基本原理及其应用背景;论述了CFD技术在紫外消毒模型建立方面的关键因素:水力、辐射和剂量模拟;从消毒效率预测和设备结构优化两个方面对CFD技术在水处理紫外消毒中的应用进行了分析,并对其前景进行了展望,提出了今后的研究重点。     

Potential particulate pollution derived from UV-induced degradation of odorous dimethyl sulfide

UV-induced degradation of odorous dimethyl sulfide (DMS) was carried out in a static White cell chamber with UV irradiation. The combination of in situ Fourier transform infrared (FT-IR) spectrometer, gas chromatograph-mass spectrometer (GC-MS), wide-range particle spectrometer (WPS) technique, filter sampling and ion chromatographic (IC) analysis was used to monitor the gaseous and potential particulate products. During 240 min of UV irradiation, the degradation e ciency of DMS attained 20.9%, and partially oxidized sulfur-containing gaseous products, such as sulfur dioxide (SO2), carbonyl sulfide (OCS), dimethyl sulfoxide (DMSO), dimethyl sulfone (DMSO2) and dimethyl disulfide (DMDS) were identified by in situ FT-IR and GC-MS analysis, respectively. Accompanying with the oxidation of DMS, suspended particles were directly detected to be formed by WPS techniques. These particles were measured mainly in the size range of accumulation mode, and increased their count median diameter throughout the whole removal process. IC analysis of the filter samples revealed that methanesulfonic acid (MSA), sulfuric acid (H2SO4) and other unidentified chemicals accounted for the major non-refractory compositions of these particles. Based on products analysis and possible intermediates formed, the degradation pathways of DMS were proposed as the combination of the O(1D)- and the OH- initiated oxidation mechanisms. A plausible formation mechanism of the suspended particles was also analyzed. It is concluded that UV-induced degradation of odorous DMS is potentially a source of particulate pollutants in the atmosphere.     

2-丁烯醛生产废水中溶解性有机物的分级解析

采用超滤膜法将2-丁烯醛生产废水中的有机物分为相对分子质量不同的7个级分,并应用溶解性有机碳(dissolved organic carbon,DOC)、紫外吸收光谱(ultraviolet spectrum,UV)、傅里叶变换红外光谱(fourier transform infrared spectrometer,FT-IR)和气相色谱/质谱联用仪(gas chromatography with mass spectrometry,GC-MS)技术对不同相对分子质量区间的有机物所占比例及物质结构进行了研究.结果表明,废水中相对分子质量1×103的有机物所占比例最高,达到88.57%;采用GCMS对废水中相对分子质量1×103的级分进行分析,定性出27种化合物,包含醛、酮、酯、醇、酚、酸、烷烃类及其他苯系物等,其峰面积占有机物峰面积总和的比例分别为6.9%、5.3%、35.4%、13.2%、4.6%、0.4%、1.7%、16.8%,总和为84%.UV和FT-IR分析结果均显示不同相对分子质量区间的光谱吸收特征没有明显差别,级分中存在含有不饱和双键、羟基、羰基化合物及芳香族化合物,与GC-MS检测结果相吻合.研究结果为废水处理工艺的开发与优化提供了重要的指导作用.     

Efficient dechlorination of chlorinated solvent pollutants under UV irradiation by using the synthesized TiO2 nano-sheets in aqueous phase

Titanium dioxide(TiO2), which is the widely used photo-catalyst, has been synthesized by simple hydrothermal solution containing tetrabutyl titanate and hydrofluoric acid. The synthesized product has been applied to photo-degradation in aqueous phase of chlorinated solvents, namely tetrachloroethene(PCE), trichloroethene(TCE) and 1,1,1-trichloroethane(TCA). The photo-degradation results revealed that the degradation of these harmful chemicals was better in UV/synthesized TiO2 system compared to UV/commercial P25 system and UV only system. The photo-catalytic efficiency of the synthesized TiO2 was 1.4, 1.8 and 3.0 folds higher compared to the commercial P25 for TCA, TCE and PCE degradation, respectively. Moreover, using nitrobenzene(NB) as a probe of hydroxyl radical(.OH), the degradation rate was better over UV/synthesized TiO2, suggesting the high concentration of.OH generated in UV/synthesized TiO2system. In addition,.OH concentration was confirmed by the strong peak displayed in EPR analysis over UV/synthesized TiO2system. The characterization result using XRD and TEM showed that the synthesized TiO2 was in anatase form and consisted of well-defined sheet-shaped structures having a rectangular outline with a thickness of 4 nm, side length of 50 nm and width of 33 nm and a surface 90.3 m2/g. XPS analysis revealed that ≡Ti-F bond was formed on the surface of the synthesized TiO2. The above results on both photocatalytic activity and the surface analysis demonstrated the good applicability of the synthesized TiO2 nano-sheets for the remediation of chlorinated solvent contaminated groundwater.     

再生水中5种抗生素抗性菌的紫外线灭活及复活特性研究

抗生素抗性菌作为再生水中的新兴污染物而受到广泛关注.为探明紫外线对抗生素抗性菌的灭活和消毒后抗性菌的复活潜能,研究了以城市污水为水源的再生水(简称"再生水")中青霉素抗性菌、氨苄青霉素抗性菌、头孢氨苄抗性菌、氯霉素抗性菌和利福平抗性菌的紫外线灭活特性,并考察了再生水中的抗生素抗性菌在黑暗条件下的复活潜能.结果表明,20mJ·cm-2紫外线消毒剂量下,实际再生水中青霉素抗性菌、氨苄青霉素抗性菌、头孢氨苄抗性菌和氯霉素抗性菌的灭活率均高于4-log,与总异养菌群灭活率相当,而利福平抗性菌的灭活率(3.7-log)略低于总异养菌群.紫外线消毒后,再生水静置22 h后,抗生素抗性菌普遍出现复活现象,当紫外线消毒剂量为常规剂量20 mJ·cm-2时,消毒后再生水中的抗生素抗性菌菌落形成能力高达3-log.因此,常规的紫外线消毒剂量不能有效控制再生水储存或运输过程中抗生素抗性菌的复活.     

K_2Cr_2O_7法和紫外分光光度法测定污水COD的对比研究

分别利用重铬酸钾法、重铬酸钾紫外分光光度法和紫外分光光度法测定污水的COD极差分别为2.43mg/L、1.19 mg/L和4.72 mg/L,RE%分别为0.84%、0.53%和1.36%,重铬酸钾紫外分光光度法和紫外分光光度法的线性范围分别在0~280 mg/L和0~400 mg/L.结果表明:重铬酸钾紫外分光光度法测定的准确度和精密度最高,简化了用标准溶液进行标定的步骤,缩短了实验时间;紫外分光光度法测定的结果准确度和精密度相对差一些,但是快速、操作简单、节省试剂,为广大环境工作者提供借鉴参考的实例。     

UV/SPS降解水中三氯生的效能及动力学

采用短波紫外光激活过硫酸钠(UV/SPS)对水中三氯生(TCS)的去除进行了研究,考察了紫外光波长、紫外光强、过硫酸钠(SPS)投加量、pH值和腐殖酸(HA)等因素对TCS去除的影响,计算了自由基(·OH、SO_4~(·-))与TCS的二级反应速率常数及其对TCS去除的贡献值,鉴定了反应中主导自由基,对比了UV254/SPS和UV254/H_2O_2对天然水体中TCS的去除效果,GC/MS分析了TCS降解的中间产物及可能的降解路径.结果表明UV/SPS能有效去除TCS,紫外光波长为254nm,光强为11.5μW·cm-2,SPS浓度为1 mmol·L~(-1)时,100s后初始浓度为275μg·L~(-1)的TCS去除率可达98.15%,TCS降解过程符合拟一级反应动力学方程,其动力学常数K=0.039 2 s~(-1).实验范围内TCS去除的速率常数随紫外光强(I)和SPS投加量的增加而增大,波长对TCS去除影响不显著,中性条件不利于TCS降解,HA对TCS去除具有抑制作用.·OH和SO_4~(·-)与TCS反应速率常数分别为7.62×109L·mol~(-1)·s~(-1)、9.86×109L·mol~(-1)·s~(-1),UV254/SPS中主导自由基为SO_4~(·-),其对TCS去除贡献率为97.63%.UV254/SPS工艺更能有效地去除TCS,其拟一级动力学常数K值是UV254/H_2O_2工艺的4.13倍.TCS降解过程中主要生成了2,4-二氯苯酚(2,4-DCP)、苯酚等中间产物.